An optimized and simplified compact ECR ion source for gaseous species

Boukari, F.; Wartski, L.; Roy, Vincent; Coste, Philippe; Schwebel, C.; Aubert, J.; Souza, Márcia Cristina de

doi:10.1016/0168-583x(95)00503-x

Cited by 8 publications

(4 citation statements)

References 12 publications

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“…By varying the gas flow, one can tune the source for the maximal value of ion current that is typical for such type ion sources. For example, the similar behaviour of ion current with gas flow was observed in paper [8]. Also, we checked the influence of the magnet ring centre displacement with respect to resonator gap centre on the ion current.…”

Section: Preliminary Testssupporting

confidence: 67%

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Development of compact 2.45 GHz ECR ion source for generation of singly charged ions

et al. 2019

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A: 2.45 GHz ECR ion sources are widely used for production of single charged heavy ions and secondary radioactive ion beams. This paper describes the development of a compact ECR ion source based on coaxial quarter wave resonator. The first results of extracted current measurements at different resonator configuration as a function of UHF frequency, power and gas flow are presented. At the extraction voltage about of 10 kV and UHF power about of 100 W more than 500 µA of He + ions were produced with the extraction hole of 3 mm in diameter that corresponds to the current density of 7.5 mA/cm 2 . K: Ion sources (positive ions, negative ions, electron cyclotron resonance (ECR), electron beam (EBIS)); Accelerator Subsystems and Technologies 1Corresponding author.

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Section: Preliminary Testssupporting

confidence: 67%

“…The diameter of the extraction hole in plasma electrodes is 2 mm. Several compact 2.45 GHz ECR ion sources, based on quarter wave structures (Lecher line and quarter wave antenna) and different permanent magnet systems are already described [7][8][9]. All these sources have shown good performances.…”

Section: Design Of the Sourcementioning

confidence: 99%

Development of compact 2.45 GHz ECR ion source for generation of singly charged ions

et al. 2019

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“…The ferromagnetic electrodes and the barrier are elaborated without vacuum break. A microwave ion source Plasmion Simo 30 is used to generate an argon beam of 1 keV [7] with an incident angle of 45-on the sputtering target. The cobalt (Co) and permalloy (Ni 80 Fe 20 ) are elaborated with a deposition rate of 0.3 nm min À 1 and a thickness range from 5 to 15 nm.…”

Section: Methodsmentioning

confidence: 99%

“…This deposition method has the following advantages: first, it can deposit metallic and oxide thin layers with a good uniformity [5][6][7][8] and a fine control of the thickness by low rates of deposition (0.05 -0.3 nm min À 1 ). Secondly, the high vacuum environment reduces the layer contamination.…”

Section: Introductionmentioning

confidence: 99%