2014
DOI: 10.1016/j.ejmp.2013.03.005
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An optimized calibration method for surface measurements with MOSFETs in shaped-beam radiosurgery

Abstract: Nowadays MOSFET dosimeters are widely used for dose verification in radiotherapy procedures. Although their sensitive area satisfies size requirements for small field dosimetry, their use in radiosurgery has rarely been reported. The aim of this study is to propose and optimize a calibration method to perform surface measurements in 6 MV shaped-beam radiosurgery for field sizes down to 18 × 18 mm(2). The effect of different parameters such as recovery time between 2 readings, batch uniformity and build-up cap … Show more

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Cited by 7 publications
(4 citation statements)
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“…At 18×18 mm², the attenuation is maximal using Constraint 2, where all the detectors are positioned at the beam entry. The attenuation thus becomes comparable with that attained with fixed beams [25]. For comparison, the attenuation of OSLs equipped with electronic water-equivalent caps was estimated at 4.6 %, and for the diodes the attenuation varies between 5.4 % and 12 % [31].…”
Section: Discussionmentioning
confidence: 70%
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“…At 18×18 mm², the attenuation is maximal using Constraint 2, where all the detectors are positioned at the beam entry. The attenuation thus becomes comparable with that attained with fixed beams [25]. For comparison, the attenuation of OSLs equipped with electronic water-equivalent caps was estimated at 4.6 %, and for the diodes the attenuation varies between 5.4 % and 12 % [31].…”
Section: Discussionmentioning
confidence: 70%
“…The constraints were investigated from 1 to 4 for 30×30 mm² field size, and from 4 to 1 for the 18×18 mm² field size. MOSFETs (calibrated by the optimised calibration method previously described) were readout 30 s after each irradiation in order to obtain a stable readout without fading effect [25]. For all constraint geometries the time between two consecutive measurements was 3.5 minutes and never more than 5 minutes.…”
Section: Experimental Evaluation Of the Inverse Solutionmentioning
confidence: 99%
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“…Electronhole pairs are formed by incident radiation within the depletion layer [10]. Electron mobility in SiO2 at room temperature is around four orders larger than holes, move rapidly out of the gate electrode while holes move stochastically to the Si/SiO 2 interface where they are stuck in long-term locations, creating a negative voltage shift (VTH) that can persist for years [11]. The difference in the voltage change can be measured before and after exposure and is proportional to the dose.…”
Section: Mosfetmentioning
confidence: 99%