2022
DOI: 10.1016/j.jcis.2021.11.163
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An Ultra-Thin Near-Perfect Absorber via Block Copolymer Engineered Metasurfaces

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Cited by 8 publications
(3 citation statements)
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“…Reprinted with permission from Ref. [265], copyright 2022, Elsevier. (c) (i) BCP patterning processes for phase change memory (PCM).…”
Section: Block Copolymer Self-assemblymentioning
confidence: 99%
See 1 more Smart Citation
“…Reprinted with permission from Ref. [265], copyright 2022, Elsevier. (c) (i) BCP patterning processes for phase change memory (PCM).…”
Section: Block Copolymer Self-assemblymentioning
confidence: 99%
“…Also, BCP-based ultrathin near-perfect absorbers based on Au and Al2normalO3 have been demonstrated [Fig. 12(b)] [265] . In this method, most of the fabrication steps are compatible with conventional nanomanufacturing processes such as etching, evaporation, and lift-off.…”
Section: Block Copolymer Self-assemblymentioning
confidence: 99%
“…The interaction between the electromagnetic radiation and matter is the footing stone of all optical physics [ 1 ]. Reflection, absorption and transmission are not only important macroscopic parameters for describing the field-regulating characteristics of those physical processes, but also the main themes of typical applications as antireflective coatings [ 2 , 3 , 4 , 5 , 6 , 7 , 8 ] and perfect absorber [ 9 , 10 , 11 , 12 , 13 , 14 , 15 , 16 ]. For the time being, the emerging optoelectronic applications are placing urgent demands on functional materials with specified properties: broadband, ultrathin thickness, flexibility, non-iridescent.…”
Section: Introductionmentioning
confidence: 99%