2023
DOI: 10.1039/d3tc00265a
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An ultralow-k dielectric derived from a fluorinated polybenzoxazole composite film with yolk–multishell mesoporous silica nanostructures

Abstract: In order to solve the problem of signal delay and crosstalk caused by miniaturization of VLSI, it is urgently required to further reduce the dielectric constant (k) of materials. So...

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Cited by 6 publications
(3 citation statements)
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“…Conspicuously, the detected dielectric constants are lower than those of most commercial lowk materials, including SiO 2 (k = 4.0), polyarylene ether (k = 3.0), fluropolyimide (k = 2.8), hydrogen silsesquioxane (k = 3.0), polysiloxane (k = 2.89), and benzocyclobutane (k = 2.7). 54,55 Accordingly, the fabricated PMHS-g-VTMS Silica aerogels hold great promise as an alternative for preparing lightweight and flexible conformal antennas.…”
Section: Dielectric Properties and Triboelectric Performancementioning
confidence: 99%
“…Conspicuously, the detected dielectric constants are lower than those of most commercial lowk materials, including SiO 2 (k = 4.0), polyarylene ether (k = 3.0), fluropolyimide (k = 2.8), hydrogen silsesquioxane (k = 3.0), polysiloxane (k = 2.89), and benzocyclobutane (k = 2.7). 54,55 Accordingly, the fabricated PMHS-g-VTMS Silica aerogels hold great promise as an alternative for preparing lightweight and flexible conformal antennas.…”
Section: Dielectric Properties and Triboelectric Performancementioning
confidence: 99%
“…Low dielectric constant (low- k ) polymers are essential in electronic communications for enhancing signal transmission speed and minimizing signal loss. Polybenzoxazine is a promising thermosetting resin with low intrinsic dielectric constant, low water absorption, and high thermal stability, for which reason it has received great attention in the electronics industry. Designing functional groups in the molecular structure of benzoxazines can further reduce the dielectric constant. Common strategies for developing low- k resins include reducing the molecular polarizability and decreasing the number density. , Through the flexible molecular design properties of benzoxazine monomers, the above strategies can be readily achieved …”
Section: Introductionmentioning
confidence: 99%
“…However, challenges persist as small molecules embedded in the polymer may not be entirely removed, impacting dielectric properties. Zhuang introduced a novel and controllable selective etching strategy to fabricate yolk-multishell mesoporous silica nanoparticles, albeit involving HF etching of SiO 2 layers [15]. In addition, the integration of Cage polyhedral oligomeric silsesquioxane (POSS) hollow nanoparticles into polymers has been explored to develop low-k nano hybrid materials.…”
Section: Introductionmentioning
confidence: 99%