2004
DOI: 10.1021/ja048972k
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An Ultraviolet-Curable Mold for Sub-100-nm Lithography

Abstract: We describe a novel UV-curable mold that is stiff enough for replicating dense sub-100-nm features even with a high aspect ratio. It also allows for flexibility when the mold is prepared on a flexible support such that large area replication can be accomplished. The composite material of the mold is inert to chemicals and solvents. The surface energy is made low with a small amount of releasing agent such that the mold can be removed easily and cleanly after patterning. In addition, the material allows self-re… Show more

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Cited by 294 publications
(293 citation statements)
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“…25 The second approach renders complete transfer of submicrometer features with sub-50 nm edge resolution using a chemical catalyst bound to a rigid polymeric stamp capable of supporting very accurate high-resolution patterns. 27,28 In this variation, a polyurethane-acrylate stamp bearing 2-aminomethyl piperidine was used to promote catalytic deprotection of an Fmoc-protected SAM. The technique achieves 100% cleavage of Fmoc-groups in regions of stamp-substrate contact and allows subsequent functionalization of printed surfaces.…”
mentioning
confidence: 99%
“…25 The second approach renders complete transfer of submicrometer features with sub-50 nm edge resolution using a chemical catalyst bound to a rigid polymeric stamp capable of supporting very accurate high-resolution patterns. 27,28 In this variation, a polyurethane-acrylate stamp bearing 2-aminomethyl piperidine was used to promote catalytic deprotection of an Fmoc-protected SAM. The technique achieves 100% cleavage of Fmoc-groups in regions of stamp-substrate contact and allows subsequent functionalization of printed surfaces.…”
mentioning
confidence: 99%
“…The droplet then spread, forming a thin precursor layer. After droplet 45 spreading, we used a 75 ms UV exposure to generate maskdefined polymerized structures in the sandwiched precursor layer. Typically, photocrosslinked PEGDA structures between glass slides adhered to the glass surfaces.…”
Section: Oxygen Inhibited Radical Polymerization On Pfpe Surfacesmentioning
confidence: 99%
“…Also, the PU monomer was selected as an exemplary hydrophobic monomer among a wide range of water-10 insoluble monomers. This UV curable hydrophobic monomer has been used for the preparation of replica molds that have patterns with sub-100nm feature resolutions and low surface energy comparable to PDMS 45 . In addition, PU has provided biocompatibility for the construction of scaffolds in tissue 15 engineering 46,47 .…”
Section: Comparison With Pdms-based Flow Lithographymentioning
confidence: 99%
“…Drops of a prepolymer solution of polyurethane acrylate (PUA) were dispensed onto this template, and the film was lightly pressed with a polyethylene terephthalate (PET) backplane sheet. Exposure to ultraviolet light cures the prepolymer 11 . The PET sheet removed from the template has an array of PUA prisms on its surface.…”
Section: Fabrication Of the Lucius Prism Array The Fabrication Of Thementioning
confidence: 99%