Analysis of Disc Wear Based on Trajectory Simulation in Lapping Process

Abstract

Abstract. The surface trajectory of lapping disc in lapping process was simulated in this paper. The simulation was based on the analysis of lapping disc wear trajectory by using the computer simulation technology. The law of disc wear trajectory and the influence of processing parameters were studied. The computer simulation of the disc wear trajectory actually reflects the condition of lapping disc wear in lapping process. When the RSR is an integer, the RSR determines the number of petals, and the number of the outermost petal is one. When the RSR is a fraction, the denominator of RSR fraction determines the number of the outermost petals, the numerator of RSR fraction determines the number of petal layers. In different eccentric distance, the lapping trajectory was distributed in the annular region whose width is 2*r A (r A is wafer point radius). For a certain rotation speed rate, n, the lapping trajectory of the wafer point with initial phase angle θ, the trajectory turns to the angle of n*θ. Analyzing trajectory simulation of the disc wear has a significant guidance for designing and makign lapping disc and the actual lapping process.