2023
DOI: 10.2514/1.j062310
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Analysis of Effect of Ground Experiment Environment on Plasma Contactor Performance

Abstract: The large difference in the working performance of a hollow cathode plasma contactor between the ground and actual on-orbit environments will cause difficulties in selecting a ground-test schemes to fully simulate the contactor real on-orbit characteristics. In this study, the effect of the simulated anode size and structure, the simulated anode surface state, the flow rate of background working gas, and the background plasma density on the emission characteristics and plume structure of the contactor are stud… Show more

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Cited by 3 publications
(2 citation statements)
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“…However, these oxide surface layers presented challenges; they could be readily sputtered by ion bombardment, which curtailed their operational lifespan [16]. Therefore, dispenser cathodes were developed to address this issue by continuously replenishing the low work function surface layer [17,18]. This innovation allowed higher emission current densities and extended lifetimes compared to oxide-coated cathodes [19].…”
Section: Introductionmentioning
confidence: 99%
“…However, these oxide surface layers presented challenges; they could be readily sputtered by ion bombardment, which curtailed their operational lifespan [16]. Therefore, dispenser cathodes were developed to address this issue by continuously replenishing the low work function surface layer [17,18]. This innovation allowed higher emission current densities and extended lifetimes compared to oxide-coated cathodes [19].…”
Section: Introductionmentioning
confidence: 99%
“…The discharge is sustained by electrons undergoing a pendulum motion inside the HC [2][3][4][5][6][7]. Hollow cathode discharges are employed in many applications, e.g., in atomic spectroscopy [1, [8][9][10], mass spectrometry [11], and laser technology [12], as UV generators [13,14] and propulsion thrusters [15,16], for the generation of neutral and ion beams [17,18], surface processing [19], thin film deposition [20][21][22][23][24][25][26][27], and in plasma chemical investigations [28][29][30][31][32][33][34].…”
Section: Introductionmentioning
confidence: 99%