Analysis of Electron Temperature in DC Ar/SF₆Plasma Using Cylindrical and Planar Probes

Abstract

Electronegative plasmas are generated by adding SF 6 gas to a background argon (Ar) DC plasma with parameters of n 0 ¼ 1 Â 10 10 cm 3 and T e ¼ 2 eV. The heating current of the thoriated filament was in the range of 20.5-21.5 A and the plasmas were generated under a discharge condition of 100 V/0.4 A. The amount of negative ions was controlled by adjusting the ratio of flow rate of SF 6 = 0-10% to that of Ar. Plasma parameters were measured using cylindrical and planar electric probes. The behavior of electrons, which means the change in a parameter due to negative ion production, is characterized by measuring the floating and plasma potentials, and electron temperature. Electron temperature seems to increase and the potentials decrease with SF 6 flow rate. #

Investigation of Compact Hollow-Anode Discharge Source for Copper Thin Films by Sputtering Processes

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Uniform plasma generation with filament assisted DC discharge in a linear plasma device

“…Production of uniform and quiescent laboratory plasma is desirable both in basic laboratory experiments such as waves and instabilities studies, as well as in plasma reactors for material processing. A large number of devices, primarily linear ones, have been developed in several laboratories across the world for the purpose of performing wave experiments [1][2][3][4][5][6][7][8][9][10][11][12][13][14]. These devices produce plasma through electron impact ionization using DC or RF power supply [7][8][9]15] or wave-induced ionization (electron cyclotron resonance(ECR) [1,6] and helicon discharge [10,11,13,14,16]).…”