2009
DOI: 10.1063/1.3223288
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Analysis of linewidth enhancement factor for quantum well structures based on InGaAsN/GaAs material system

Abstract: We performed an extensive numerical study of the linewidth enhancement factor ͑␣-parameter͒ in single and multiple-quantum-well structures built from In 0.38 Ga 0.62 As 1−y N y / GaAs material systems. A ten-band kp Hamiltonian matrix was used in the calculations and solved self-consistently with Poisson's equation. The linewidth enhancement factor was evaluated as a function of wavelength, nitrogen composition, well width, and carrier density and shows significant dependence on those parameters. The simulated… Show more

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Cited by 13 publications
(15 citation statements)
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“…In our computational results, the total number of dips is 1.43 × 10 6 for α = 3 and 5.5 × 10 5 for α = 2, which also suggests that the employed SOA in [5] has an LWEF that varies between 2 and 3. It should be reiterated that the time dependency of the LWEF is not considered in this study, as was the case with prior studies [2,[5][6][7][8][9][10][15][16][17][18][19]. Hence, our estimation for the LWEF of the employed SOA involves a range of values (2 < α < 3) over a single roundtrip rather than a constant value.…”
Section: Comparison With Experimental Resultsmentioning
confidence: 95%
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“…In our computational results, the total number of dips is 1.43 × 10 6 for α = 3 and 5.5 × 10 5 for α = 2, which also suggests that the employed SOA in [5] has an LWEF that varies between 2 and 3. It should be reiterated that the time dependency of the LWEF is not considered in this study, as was the case with prior studies [2,[5][6][7][8][9][10][15][16][17][18][19]. Hence, our estimation for the LWEF of the employed SOA involves a range of values (2 < α < 3) over a single roundtrip rather than a constant value.…”
Section: Comparison With Experimental Resultsmentioning
confidence: 95%
“…8 shows another undesired effect of a high LWEF on the intracavity signal, which is significant decrease in power. Fortunately, most quantum well-based SOAs have LWEFs that are in the range of 1-5 [16]. Hence, the issue of LWEF related power-loss is relatively less significant in an FDML laser cavity as compared to dip formation.…”
Section: Convergence Of Error Versus Lwefmentioning
confidence: 99%
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“…The insertion was introduced by N plasma irradiation during a growth interruption. Finally, a 150 nm thick GaAs cap layer was grown at the same temperature of 420 C. Thin cross-sectional TEM foils were prepared along the [110] and the orthogonal [1][2][3][4][5][6][7][8][9][10] projections. The specimens were thinned by mechanical polishing followed by Ar-ion milling.…”
mentioning
confidence: 99%