The present work is intended to prepare manganese doped cobalt oxide electrodes on copper and porous copper substrate by electrodeposited technique. Structural, morphological and electrochemical characterizations of the prepared samples were examined by using XRD, SEM, EDAX, FTIR and electrochemical measurements. Structural studies confirm MnCo3O4 Film has face centred cubic (FCC) with polycrystalline nature. Morphological observation of the prepared films confirms the formation of nano flake like structures on copper substrates and nano rod like structures on copper porous substrates. The electrochemical performance of MnCo3O4 electrode was tested by cyclic voltammetry, impedance and Galvanostatic charge-discharge measurements. Cyclic voltammetry observation shows films deposited on copper substrates has mixed capacitive behaviour with maximum specific capacitance of 1020 F/g and films deposited on porous copper substrates has specific capacitance of 1467 F/g at the scan rate of 10 mV/s in 1M KOH electrolyte.