1989
DOI: 10.1007/bf00616989
|View full text |Cite
|
Sign up to set email alerts
|

Analysis of positron diffusion data

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1

Citation Types

2
13
0

Year Published

1991
1991
2014
2014

Publication Types

Select...
7
1

Relationship

0
8

Authors

Journals

citations
Cited by 25 publications
(15 citation statements)
references
References 27 publications
2
13
0
Order By: Relevance
“…The difference in the diffusion length between the ϩ50 and Ϫ50 V will give an estimate of the error. Huomo et al 40 proposed another method to analyze the S and F parameters when nonthermal positrons are present. They chose a minimum implantation energy for the data analysis and assumed that S is a nearly linear function of F. The deviation from linearity is mainly associated with nonthermal positrons reaching the surface.…”
Section: Analysis Of Diffusion Datamentioning
confidence: 99%
See 1 more Smart Citation
“…The difference in the diffusion length between the ϩ50 and Ϫ50 V will give an estimate of the error. Huomo et al 40 proposed another method to analyze the S and F parameters when nonthermal positrons are present. They chose a minimum implantation energy for the data analysis and assumed that S is a nearly linear function of F. The deviation from linearity is mainly associated with nonthermal positrons reaching the surface.…”
Section: Analysis Of Diffusion Datamentioning
confidence: 99%
“…Because the mean free path for nonthermal positrons is short, 34 they can reach the surface only if the mean implantation depth is small. 40 Thus the number of nonthermal positrons reaching the surface decreases rapidly as the incident energy is increased. Evidence that the data in Fig.…”
Section: Measurements Of Diffusion Length In Ga Bi Sn and Namentioning
confidence: 99%
“…Previously, S maxima at low energy were also found on foils with no anodizing treatment, 7,8,17 and were shown to be due to voids in the Al metal near the oxide/aluminum interface. 7,8 In Fig.…”
Section: S-energy Profiles-mentioning
confidence: 90%
“…H =(l -jfo)Fs-^(\ -F^) is a normalization factor [7]. Sps is the S parameter associated with the fraction (j /o) of positrons that annihilate after forming para-Ps (note that the fraction j/o that form ortho-Ps do not contribute to S because they undergo 3/ photon annihilation), 5ss is associated with the fraction (1 -/o) annihilating from the surface state.…”
mentioning
confidence: 99%
“…This formalism does not include nonthermal positrons, which affect S and F measurements [3,7] at low implantation energies. Huomo, Soininen, and Vehanen [7] have proposed to choose a minimum implantation energy for the data analysis.…”
mentioning
confidence: 99%