1967
DOI: 10.2172/4304099
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Analysis of Radiation Effects in Semiconductor Junction Devices.

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“…This technique yields not only the effective surface concentrations but also the j unction depths, the effects of out-diffusion from the substrate or buri6d layer, and the width of the epitaxial layer. The technique is non-destructive and is valid ili the presence [21][22][23][24] of neutron-induced traps and/or gold centers. Other investigators have devised techniques to establish the neutron-induced changes in the electrical characteristics of semiconductor devices by computer-sided modeling.…”
Section: -mentioning
confidence: 99%
“…This technique yields not only the effective surface concentrations but also the j unction depths, the effects of out-diffusion from the substrate or buri6d layer, and the width of the epitaxial layer. The technique is non-destructive and is valid ili the presence [21][22][23][24] of neutron-induced traps and/or gold centers. Other investigators have devised techniques to establish the neutron-induced changes in the electrical characteristics of semiconductor devices by computer-sided modeling.…”
Section: -mentioning
confidence: 99%
“…Device simulation consisted of 1‐D drift‐diffusion (DD) models is discussed in . In a DD model, current equations are derived from the Boltzmann transport equation considering a steady state situation and numerical approximations for a 1‐D geometry.…”
Section: Introductionmentioning
confidence: 99%