2006
DOI: 10.1109/tdmr.2006.883128
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Analysis of the Back-Gate Effect on the on-State Breakdown Voltage of Smartpower SOI Devices

Abstract: This paper discusses the impact of the back-gate bias on the ON-state drain breakdown voltage of high-voltage silicon-on-insulator (SOI) MOSFETs. This is mandatory in order to understand the physical mechanisms behind the limitations of the safe operation area (SOA) of SOI power devices. The back-gate electrode of the SOI material will add an additional dimension to the SOA, thereby causing further reliability constraints on the circuit design. For small and negative back-gate bias, the SOA is limited by the O… Show more

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Cited by 7 publications
(2 citation statements)
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“…One of the major challenges is the back-gate effect: the silicon substrate under the BOX layer acts as a back gate for the transistors built on SOI. Therefore, the potential of silicon substrate affects the threshold voltage and leakage current of the transistors [15]. Buried P-Well (BPW) technology has been proposed by KEK [16,17] to suppress the back-gate effect.…”
Section: Introductionmentioning
confidence: 99%
“…One of the major challenges is the back-gate effect: the silicon substrate under the BOX layer acts as a back gate for the transistors built on SOI. Therefore, the potential of silicon substrate affects the threshold voltage and leakage current of the transistors [15]. Buried P-Well (BPW) technology has been proposed by KEK [16,17] to suppress the back-gate effect.…”
Section: Introductionmentioning
confidence: 99%
“…Finally, smart usage of field-plate potentials can be beneficial not only for off-state breakdown optimization as discussed here, but also for active R ON reduction as discussed in [64]. Understandably, non-optimal field-plate potentials can reduce both on and off-state breakdown, this parasitic effect is discussed in [65]. …”
Section: Field-plate Potentialmentioning
confidence: 96%