2019
DOI: 10.1134/s1063785019020056
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Analysis of the Structure of Multilayer Nanocrystalline Coatings Based on Plasma Mass Transfer Parameters Calculated by the Monte Carlo Method

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Cited by 5 publications
(3 citation statements)
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“…The elemental composition of the obtained coatings is shown in the Table . The change in the composition was achieved by different arrangement of the used cathodes (TiNi, Cr and Ti) in the corresponding evaporation blocks of the unit, taking into account the fact that up to 80 % of the evaporated material vanishes in them, in the presence of magnetic separators [12].…”
Section: Resultsmentioning
confidence: 99%
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“…The elemental composition of the obtained coatings is shown in the Table . The change in the composition was achieved by different arrangement of the used cathodes (TiNi, Cr and Ti) in the corresponding evaporation blocks of the unit, taking into account the fact that up to 80 % of the evaporated material vanishes in them, in the presence of magnetic separators [12].…”
Section: Resultsmentioning
confidence: 99%
“…The coatings were deposited on VK6 alloy substrates by arc-PVD method using a three-cathode vacu um-arc ion-plasma unit equipped with two magnetic drop fraction separators. The planetary rotation of the substrate holders ensures the formation of a coating with a two-level structure, including the layers obtained by rota ting the substrate holders around the table axis, and the sublayers several nanometers thick with a well-defined interface, which are formed due to the rotation of the substrate holders around their axis [12]. The current strength of the arc evaporating the cathodes was determined on the basis of its value ensuring stable arc burning and the absence of a considerable amount of the droplet phase in the formed plasma flow.…”
Section: Research Methods Research Methodsmentioning
confidence: 99%
“…Alongside nanorods works, Pflug et al [24] studied the growth of ZnO:Al during reactive sputtering by expanding direct simulation MC to include surface reactions. Chernogor et al [25,26] performed MC computations to study the properties of TiCrN-Mo 2 N-Ni films during arc discharge PVD. Chen et al [27] proposed a kMC model for predicting the grain boundary during MoS 2 growth.…”
Section: Physical Vapor Depositionmentioning
confidence: 99%