Analysis of the substrate effect on the nucleation and growth mode of electrodeposited cobalt on copper and graphite electrodes

Harti, H.; Bubendorff, Jean-Luc; Florentin, A.; Pirri, Candido Fabrizio; Ebothé, J.

doi:10.1016/j.jcrysgro.2011.01.028

Cited by 13 publications

(6 citation statements)

References 46 publications

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“…Up to date, cobalt has been electrodeposited from chloride, 1,2,10-12 sulfate 13 and citrate [14][15][16] aqueous baths as well as from the urea-choline chloride-CoCl 2 melt 17 and deep eutectic solvent, 18 the influence of deposition parameters on current efficiency, 12 deposit morphology, 19 structure 20 and magnetic properties 19,21,22 was also investigated. With respect to the electrocrystallization mechanism, the influence of many factors such as cobalt concentration, 2 pH, 23,24 temperature, 25 substrate [26][27][28] and ultrasound 29 on the nucleation and growth of cobalt has been reported in previous studies, however, it should be emphasized here that most researches were performed in weakly-acidic and dilute solution, only the work performed at high pH by Grujicic and Pesic 23 and the work performed in concentrated solution by Bertazzoli et al 24 were noted as an exception, no research on the electrocrystallization mechanism from strongly-acidic and concentrated solution has been documented. Furthermore, in the past two decades, methanesulfonic acid (MSA) electrolyte has attracted increasing interest and is demonstrated to be a promising electrolyte in the electrodeposition of metal and their alloys, 30,31 when it is employed to the electrodeposition of cobalt, the MSA electrolyte has comparable high conductivity as the hydrochloric acid electrolyte but is less corrosive, 31 in particular, it avoids the formation of Cl 2 gas on anode, 12 consequently, the MSA electrolyte may be a suitable alternative of the traditional chloride bath, however, research on the electrodeposition of cobalt from MSA electrolyte remains unreported.…”

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confidence: 99%

Electrochemical Nucleation and Growth of Cobalt from Methanesulfonic Acid Electrolyte

Kong

Zhou

Meng

et al. 2018

J. Electrochem. Soc.

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Electrochemical nucleation and growth of cobalt onto glassy carbon electrode (GCE) from methanesulfonic acid (MSA) electrolyte was investigated, the influence of pH and cobalt concentration on the electrocrystallization mechanism was also examined. Cyclic voltammetry experiments indicate a pH and cobalt concentration dependence of the onset potential and a deposit phase change with decreasing pH was also noted. From analysis of current transients, the diffusion coefficient of cobalt ion was estimated as 1.89 × 10 -5 cm 2 s -1 . The electrocrystallization mechanism for 0.6 mol/L Co 2+ follows the instantaneous nucleation with kinetic controlled growth and is independent of the bath pH while the mechanism for 0.2 mol/L Co 2+ follows the progressive nucleation with diffusion controlled growth at pH = 2.0 and then goes to instantaneous nucleation with kinetic controlled growth at pH = 1.5 and exhibits a process of progressive nucleation with kinetic controlled growth with lower pH of 1.0.

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confidence: 99%

Electrochemical Nucleation and Growth of Cobalt from Methanesulfonic Acid Electrolyte

Kong

Zhou

Meng

et al. 2018

J. Electrochem. Soc.

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“…Furthermore, the value is compared with that of the previously reported diffusion coefficient of Co(II) species in different solutions including aqueous solutions [45][46][47][48][49][50][51] and nonaqueous systems, 6,18,20,36,[39][40][41][52][53][54][55][56][57] and then shown in Table I. As shown in Table I, the diffusion coefficient of Co(II) in EG is with around one or two order of magnitude larger than that of Co(II) in ChCl-urea, 6,18 some aprotic ILs(including BMIMBF 4 , 20 BMPTFSI 56 and BMPTFSA 57 ) and other else nonaqueous organic solution (acetamide 54,55 ).…”

Section: Resultsmentioning

confidence: 99%

Effects of Deposition Potential and Temperature on Co(II) Reduction and Electrocrystallization for Preparing Nanocrystalline Co Coatings in Ethylene Glycol Solution

Yang

Zou

et al. 2022

J. Electrochem. Soc.

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Based on cyclic voltammetry (CV) and chronoamperometry (CA) experiments, the effects of deposition potential and temperature on Co(II) reduction and electrocrystallization in ethylene glycol (EG) are reported. CV observations show that Co(II) reduction reaction is irreversible, and both the equilibrium potential and nucleation overpotential, ηnucleation, move to more positive values as the temperature is improved. The diffusion coefficient of Co(II) is 2.24 × 10-6 cm2 s-1 at 323 K and the activation energy for bulk diffusion (Ebd) of Co(II) is 22.03 ± 0.8 kJ mol-1. CA observations show that the Co electrocrystallization mechanism is a 3D nucleation and growth of a new phase under diffusion control. Its mechanism is an instantaneous regime at 323 K at various applied potentials, however, the mechanism changes from a progressive nucleation to an instantaneous nucleation at -1.10 V as the temperature increases. The cobalt nuclei are spherical microstructure, and these innumerable spherical crystal particles can align compactly to form many wirelike crystals bundles. XRD observation confirms the characteristic peak of crystalline Co with a preferred orientation direction and the average size of Co grains is 19 nm. It is also found that the Co coating thickness is affect by the potential and temperature.

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“…We will do it in a future paper. Here, the very important point is that it is not possible to determine the quantity of deposition Co by a deposition-dissolution experimental procedure (integrating the Co-dissolution peak over time while sweeping the electrode potential), as described in references [37][38][39]. So, authors that are avoided of the phenomenon used other experimental methods like Rutherford Back Scattering to determine the thickness of the electrodeposit [15,19].…”

Section: Current-voltage Characteristicmentioning

confidence: 99%

Potentiostatic controlled nucleation and growth modes of electrodeposited cobalt thin films on n-Si(1 1 1)

Mechehoud¹,

Khelil²,

Hakiki³

et al. 2016

Eur. Phys. J. Appl. Phys.

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The nucleation and growth of Co electrodeposits on n-Si(111) substrate have been investigated as a function of the applied potential in a large potential range using electrochemical techniques (voltammetry and chrono-amperometry) and surface imaging by Atomic Force Microscopy (AFM). The surface preparation of the sample is crucial and we achieve a controlled n-Si(111) surface with mono-atomic steps and flat terraces. We observe an increase of the Co yields in the electrodeposition process with the potential due to a lower contribution of hydrogen release at higher overpotentials. Using Scharifker-Hills models for fitting the current-time transients, we show that a transition from an instantaneous nucleation process to a progressive one occurs when the overpotential increases. We show A good agreement between the nucleation and growth parameters extracted from the models and the AFM data's is observed. The growth is of the Volmer-Weber type with a roughness and a mean diameter a spatial extension in the substrate plane of the deposited islands that increase with thickness.

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Analysis of the substrate effect on the nucleation and growth mode of electrodeposited cobalt on copper and graphite electrodes

Cited by 13 publications

References 46 publications

Electrochemical Nucleation and Growth of Cobalt from Methanesulfonic Acid Electrolyte

Electrochemical Nucleation and Growth of Cobalt from Methanesulfonic Acid Electrolyte

Effects of Deposition Potential and Temperature on Co(II) Reduction and Electrocrystallization for Preparing Nanocrystalline Co Coatings in Ethylene Glycol Solution

Potentiostatic controlled nucleation and growth modes of electrodeposited cobalt thin films on n-Si(1 1 1)

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