Analysis of Thin Films by Interferometric Ellipsometry

Abstract

A novel opto-electronic system for the ellipsometric analysis of thin films is described. Based on interferometric principles, the instrument permits accurate (σΔ=0.25° and σψ=0.05°) and fast (down to 5 ms) measurements. Spectroscopic applications seem promising, because the use of chromatic optical components has been avoided. The availability of an absolute reference rules out the possibility of systematic errors due to imperfections of components and of the window of the measuring cell used in ultra-high vacuum experiments.