2018
DOI: 10.1088/2040-8986/aabb59
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Analytical calculation on the determination of steep side wall angles from far field measurements

Abstract: In the semiconductor industry, the performance and capabilities of the lithographic process are evaluated by measuring specific structures. These structures are often gratings of which the shape is described by a few parameters such as period, middle critical dimension, height, and side wall angle (SWA). Upon direct measurement or retrieval of these parameters, the determination of the SWA suffers from considerable inaccuracies. Although the scattering effects that steep SWAs have on the illumination can be ob… Show more

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Cited by 4 publications
(4 citation statements)
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“…It has been demonstrated in previous work [23,25,26] that an object can be described as a phase step if its slope is sufficiently steep. The phase step will introduce an offset to the scattered light due to the path difference on either side of the step, as shown in figure 1(c).…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…It has been demonstrated in previous work [23,25,26] that an object can be described as a phase step if its slope is sufficiently steep. The phase step will introduce an offset to the scattered light due to the path difference on either side of the step, as shown in figure 1(c).…”
Section: Methodsmentioning
confidence: 99%
“…Numerical calculations using the FDTD method are carried out to verify the detection capabilities of the scheme. The rigorous electromagnetic interaction between a cliff-like structure and the focused laser beam generated by a cylindrical lens is modeled to distinguish different steep SWAs, which is closer to the experimental situation and more accurate than the scalar analysis [23]. We conduct lateral and longitudinal scanning of the structure for both TE and TM polarization, and monitor the scattered light by a split detector to analyze the polarization effect in the far field.…”
Section: Introductionmentioning
confidence: 99%
“…The nanostructure described above can be assumed to act as a pure phase object i.e. a phase step if the slope of the cliff is steep enough [9]. When the phase step interacts with an illuminating focused beam, as shown in figure 1(b), the beam will encounter different path differences across the cliff, and the resulting scattered beam will experience different offsets depending on the reflection function of the nanostructure.…”
Section: Theorymentioning
confidence: 99%
“…While there have been extensive numerical studies focused on accurately measuring both height and steep swa, a method that achieves precise measurements in both aspects remains elusive. Prior endeavors predominantly leaned on simulations and theoretical models, which offered valuable insights [7][8][9][10]. However, the practical measurements of these structural parameters remain a formidable task.…”
Section: Introductionmentioning
confidence: 99%