1996
DOI: 10.1007/s0021663550254
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Analytical performance of an r.f. capacitively coupled plasma for atomic emission with tip-ring electrode geometry

Abstract: A low to medium power radiofrequency capacitively coupled plasma is characterized as spectral source for atomic emission. The signal to background ratio and the limits of detection were determined for 19 elements as a function of the plasma torch geometry and the observation point.

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Cited by 4 publications
(2 citation statements)
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“…They have been used for the analysis of liquid, conducting and non-conducting solid samples and as a specific detector in gas chromatography. [22][23][24][25][26][27][28][29][30] At the same time the figures of merits for some elements are similar to those obtained with other plasma sources, such as microwave capacitively coupled plasma atomic emission spectrometry (CMP-AES). 23,31,32 In our laboratory a low power rf-CCP (60 W and 185 W) has been used for the direct analysis of solid samples.…”
Section: Introductionsupporting
confidence: 53%
“…They have been used for the analysis of liquid, conducting and non-conducting solid samples and as a specific detector in gas chromatography. [22][23][24][25][26][27][28][29][30] At the same time the figures of merits for some elements are similar to those obtained with other plasma sources, such as microwave capacitively coupled plasma atomic emission spectrometry (CMP-AES). 23,31,32 In our laboratory a low power rf-CCP (60 W and 185 W) has been used for the direct analysis of solid samples.…”
Section: Introductionsupporting
confidence: 53%
“…In case that the emitted radiation is collected in radial viewing mode, the observation high represents the distance from the electrode tip to the observed region of the plasma. The detailed results can be found in references [8,[10][11][12][13].…”
Section: Mhzmentioning
confidence: 99%