2015
DOI: 10.1103/physrevapplied.3.064008
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Analyzing Variability in Short-Channel Quantum Transport from Atomistic First Principles

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Cited by 10 publications
(8 citation statements)
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“…The reason is that localized doping near the source or drain region results in larger variation of the tunneling barrier height and hence larger variation of the tunneling current. It is worth mentioning that the off-state conductance and its variation can be fitted very well by a Wentzel-Kramers-Brillouin (WKB) model [16], confirming the tunneling nature of the leakage current.…”
Section: Si Transistors With Localized Dopingmentioning
confidence: 52%
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“…The reason is that localized doping near the source or drain region results in larger variation of the tunneling barrier height and hence larger variation of the tunneling current. It is worth mentioning that the off-state conductance and its variation can be fitted very well by a Wentzel-Kramers-Brillouin (WKB) model [16], confirming the tunneling nature of the leakage current.…”
Section: Si Transistors With Localized Dopingmentioning
confidence: 52%
“…Therefore the leakage current is an important issue in the design of nanotransistors. In this section, we shall investigate the possibility of suppressing leakage current and its variation by controlling the dopants' location in the channel region of Si transistors [15,16].…”
Section: Si Transistors With Localized Dopingmentioning
confidence: 99%
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“…1. This work work is published in [9] in detail and here we just give some brief outlines of it. Our goal is to predict the source-to-drain conductance variability in the off-state for channels ranging from 6.5 to 15.2 nm, doped with different concentrations of boron impurity atoms.…”
Section: Application: Silicon Nanofetmentioning
confidence: 98%
“…2(a)). The dotted curves are fitted to WKB model [9]. We assume that the conductance variability is proportional to its derivative over potential parameters such as potential barrier length or height.…”
Section: Application: Silicon Nanofetmentioning
confidence: 99%