2024
DOI: 10.1063/5.0186334
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Angle monitor of micromirror array for freeform illumination in lithography systems

Jingwei Zhang,
Jingpei Hu,
Zenghui Yang
et al.

Abstract: Source and mask optimization is a critical technique for further resolution enhancement in immersion lithography systems, wherein the optimal illumination source shape is widely generated by the micromirror array. Accordingly, the accurate achievement of the allocated angles of micromirrors is a key prerequisite for the implementation of arbitrary illumination patterns. In this paper, we propose an angle monitor to ensure the high-precision tilting of thousands of biaxial micromirrors. As one of the critical m… Show more

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