Laser Ablation 1996
DOI: 10.1016/b978-0-444-82412-7.50129-2
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Anisotropic resistivity in pulsed-laser deposited Bi2Sr2CaCu2O8+δ films

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“…Bi-2212 films were deposited by pulsed laser deposition (PLD) on 0°, 12°, 15° and 20° [100] vicinal SrTiO 3 substrates. The experimental set-up is described in [3,4]. For deposition, stoichiometric Bi-2212 targets [5] and a UV KrF-eximer laser (λ = 248 nm, Φ~3.7J/cm 2 , laser spot size on the target ~1mm 2 , target-substrate distance = 30mm, laser pulse duration and repetition rate were 25ns and 1 Hz respectively) were used.…”
Section: Introductionmentioning
confidence: 99%
“…Bi-2212 films were deposited by pulsed laser deposition (PLD) on 0°, 12°, 15° and 20° [100] vicinal SrTiO 3 substrates. The experimental set-up is described in [3,4]. For deposition, stoichiometric Bi-2212 targets [5] and a UV KrF-eximer laser (λ = 248 nm, Φ~3.7J/cm 2 , laser spot size on the target ~1mm 2 , target-substrate distance = 30mm, laser pulse duration and repetition rate were 25ns and 1 Hz respectively) were used.…”
Section: Introductionmentioning
confidence: 99%