1977
DOI: 10.1109/tmag.1977.1059456
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Anisotropy of critical currents and fields in sputtered and evaporated superconducting Nb<inf>3</inf>Ge films

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1978
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Cited by 16 publications
(2 citation statements)
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“…The stronger pinning of the silicon substrate film may be due to either higher surface or interior inhomogeneity. Besides the peak in when the field is aligned near parallel to the film surface, there is a smaller peak when it is aligned near perpendicular to this surface This feature has been observed in HTS films [8], [9] and in some low temperature superconducting (LTS) films of NbTa [10], [11]. In the LTS films, it has sometimes been attributed to columnar grain boundary inhomogeneities [10], [11].…”
Section: Thismentioning
confidence: 99%
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“…The stronger pinning of the silicon substrate film may be due to either higher surface or interior inhomogeneity. Besides the peak in when the field is aligned near parallel to the film surface, there is a smaller peak when it is aligned near perpendicular to this surface This feature has been observed in HTS films [8], [9] and in some low temperature superconducting (LTS) films of NbTa [10], [11]. In the LTS films, it has sometimes been attributed to columnar grain boundary inhomogeneities [10], [11].…”
Section: Thismentioning
confidence: 99%
“…Besides the peak in when the field is aligned near parallel to the film surface, there is a smaller peak when it is aligned near perpendicular to this surface This feature has been observed in HTS films [8], [9] and in some low temperature superconducting (LTS) films of NbTa [10], [11]. In the LTS films, it has sometimes been attributed to columnar grain boundary inhomogeneities [10], [11]. These columnar grain boundaries are essentially extended 2-D defects and are thought to produce stronger pinning in a situation in which the flux lines are aligned parallel to the columnar defect; the perpendicular flux lattice density will relate to the macroscopic pinning strength In the case of the HTS, it has sometimes been attributed to pinning along the spiral defects.…”
Section: Thismentioning
confidence: 99%