2024
DOI: 10.1038/s41377-024-01503-4
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Anneal-free ultra-low loss silicon nitride integrated photonics

Debapam Bose,
Mark W. Harrington,
Andrei Isichenko
et al.

Abstract: Heterogeneous and monolithic integration of the versatile low-loss silicon nitride platform with low-temperature materials such as silicon electronics and photonics, III–V compound semiconductors, lithium niobate, organics, and glasses has been inhibited by the need for high-temperature annealing as well as the need for different process flows for thin and thick waveguides. New techniques are needed to maintain the state-of-the-art losses, nonlinear properties, and CMOS-compatible processes while enabling this… Show more

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