2014
DOI: 10.3906/fiz-1310-3
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Annealing effects of ZnO thin films on p-Si(100) substrate deposited \newline by PFCVAD

Abstract: Abstract:In this study, ZnO films were prepared on p-Si substrates using the pulsed filtered cathodic vacuum arc deposition (PFCVAD) method. We report the effect of annealing temperature on structural and optical properties. The crystallographic structure and the size of the crystallites in the films were studied by means of X-ray diffraction. The films had a weak peak (100) orientation at 2 θ =∼ 32• . X-ray diffraction analysis of the as-deposited ZnO and the film annealed at 850• C showed a strong ZnO (002) … Show more

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Cited by 9 publications
(2 citation statements)
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“…The Kubelka-Munk (K-M) function 𝐹(𝑅) was used to convert reflectance measurements into equivalent absorption spectra. Diffuse reflectance data were transformed according to the K-M model by the following relation [40,41]:…”
Section: Resultsmentioning
confidence: 99%
“…The Kubelka-Munk (K-M) function 𝐹(𝑅) was used to convert reflectance measurements into equivalent absorption spectra. Diffuse reflectance data were transformed according to the K-M model by the following relation [40,41]:…”
Section: Resultsmentioning
confidence: 99%
“…So far, several methods have been used to grow ZnO thin films such as Molecular Beam Epitaxy (MBE) [17], Chemical Spray Pyrolysis [18], Physical Vapour Deposition (PVD) [19], Chemical Vapour Deposition (CVD) [20], Burner Flame Transport Synthesis (B-FTS) [21], Thermal Evaporation (TE) [22], Crucible Flame Transport Synthesis C-FTS) [21], Flame Spray Pyrolysis [23,24], and pulsed filtered cathodic vacuum arc deposition (PFCVAD) [25]. Among these techniques, PFCVAD was reported as a superior technique which allows a wide range of deposition rates from nanometres per minute to tens of micrometres per minute [26] with a good coating uniformity and well adhesion on substrates at room temperature [26,27].…”
Section: Introductionmentioning
confidence: 99%