2018
DOI: 10.1007/s00339-018-1584-7
|View full text |Cite
|
Sign up to set email alerts
|

Annealing study and thermal investigation on bismuth sulfide thin films prepared by chemical bath deposition in basic medium

Abstract: Bismuth sulfide thin films were prepared by chemical bath deposition using thiourea as sulfide ion source in basic medium. First, the effects of both the deposition parameters on films growth as well as the annealing effect under argon and sulfur atmosphere on asdeposited thin films were studied. The parameters were found to be influential using the Doehlert matrix experimental design methodology. Ranges for a maximum surface mass of films (3 mg cm-2) were determined. A well crystallized major phase of bismuth… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2019
2019
2024
2024

Publication Types

Select...
4

Relationship

0
4

Authors

Journals

citations
Cited by 4 publications
(1 citation statement)
references
References 53 publications
0
1
0
Order By: Relevance
“…Bi 2 S 3 , with a direct bandgap of 1.3 eV, [25][26][27] belongs to the family of compounds M 2 X 3 (where M = Bi, Sb, and X = S, Se, Te), which are considered to be promising candidates for thermoelectric applications. Various methods for the fabrication of Bi 2 S 3 thin films have been reported, including chemical bath deposition (CBD), 28,29 chemical vapor deposition (CVD), 30,31 spray pyrolysis (S.P. ), 32,33 dip-coating technology, 34 and successive ionic layer adsorption and reaction (SILAR).…”
Section: Introductionmentioning
confidence: 99%
“…Bi 2 S 3 , with a direct bandgap of 1.3 eV, [25][26][27] belongs to the family of compounds M 2 X 3 (where M = Bi, Sb, and X = S, Se, Te), which are considered to be promising candidates for thermoelectric applications. Various methods for the fabrication of Bi 2 S 3 thin films have been reported, including chemical bath deposition (CBD), 28,29 chemical vapor deposition (CVD), 30,31 spray pyrolysis (S.P. ), 32,33 dip-coating technology, 34 and successive ionic layer adsorption and reaction (SILAR).…”
Section: Introductionmentioning
confidence: 99%