Anomalous scaling in surface roughness evaluation of electrodeposited nanocrystalline Pt thin films

Nabiyouni, Gholamreza; Farahani, Bahar Jalali

doi:10.1016/j.apsusc.2009.08.041

Cited by 20 publications

(8 citation statements)

References 28 publications

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“…In the past years, thin film surfaces of oxides, metals, alloys, polymers, nitrides, semiconductors, hydrogenated amorphous carbon/Si, nanocomposites, and DLC grown by techniques such as electrodeposition, sputtering, oblique, and glancing angle depositions, molecular beam epitaxy (MBE), laser depositions, evaporation, and thermal or plasma enhanced chemical vapor deposition (CVD) has been studied extensively for scaling concepts. Studied materials included amorphous, polycrystalline, microcrystalline, epitaxial, and nanostructured systems 13–27. Among the different techniques used for the deposition of these materials, PECVD despite its wide‐spread use and great deal of flexibility to control the microstructure of thin films, have received little attention on the analysis within the concepts of DST.…”

Section: Introductionmentioning

confidence: 99%

Surface Dynamics of SiO₂‐like Films on Polymers Grown by DBD Assisted CVD at Atmospheric Pressure

Premkumar¹,

Starostin²,

Vries³

et al. 2012

Plasma Processes & Polymers

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The development of the morphology and surface roughness of amorphous SiO2‐like films, on various polymeric substrates was analyzed by atomic force microscopy. The inorganic oxide films were deposited from organo‐silicon precursors with different reactive gases using dielectric barrier discharge assisted chemical vapor deposition (DBD‐CVD) at atmospheric pressure in a roll‐to‐roll configuration. Detailed study on the roughness statistical parameters characterizing morphology shows that DBD‐CVD films grow in a conformal and layer‐by‐layer like fashion on polymers very similar to films produced by atomic layer deposition process. Independent of substrate (planarised and non‐planarised polyethylene‐2,6‐napthalate) and methodology used to build the thickness as stacks or single layers, the films were found to be smooth, both locally and globally, and show negligible development of roughness with thickness (≤350 nm). The scaling exponents observed, show that the film growth does not fall into any of the universality classes that have been reported so far.

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Section: Introductionmentioning

confidence: 99%

Surface Dynamics of SiO₂‐like Films on Polymers Grown by DBD Assisted CVD at Atmospheric Pressure

Premkumar¹,

Starostin²,

Vries³

et al. 2012

Plasma Processes & Polymers

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“…However, recent experimental contributions have shown anomalous scaling in the surface growth of films (e.g. semiconductor and oxides) [55][56][57][58][59].…”

Section: Introductionmentioning

confidence: 99%

Intrinsic anomalous scaling in a ferromagnetic thin film model

Torres

Buceta

2013

Eur. Phys. J. B

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Recently, the interest on theoretical and experimental studies of dynamic properties of the magnetic domain wall (MDW) of ferromagnetic thin films with disorder placed in an external magnetic field has increased. In order to study global and local measurable observables, we consider the (1 + 1)-dimensional model introduced by Buceta and Muraca [Physica A 390 (2011) 4192], based on rules of evolution that describe the MDW avalanches. From the values of the roughness exponents, global ζ, local ζ loc , and spectral ζ s , obtained from the global interface width, hight-difference correlation function and structure function, respectively, recent works have concluded that the universality classes should be analyzed in the context of the anomalous scaling theory. We show that the model is included in the group of systems with intrinsic anomalous scaling (ζ ≃ 1.5, ζ loc = ζ s ≃ 0.5), and that the surface of the MDW is multi-affine. With these results, we hope to establish in short term the scaling relations that verify the critical exponents of the model, including the dynamic exponent z, the exponents of the distributions of avalanche-size τ and -duration α, among others.

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“…We consider the reduction of M s is due to the increased thickness of magnetically dead layer formed at the Pd/Co or Pd/Ni interface. The thicker Pd layer has a rougher surface, 28 and thereupon would bring a thicker dead layer in which the magnetic spins are in a disordered (paramagnetic) state possibly due to intermixing or alloy formation. 29 Fig.…”

Section: Methodsmentioning

confidence: 99%

Magnetic damping and perpendicular magnetic anisotropy in Pd-buffered [Co/Ni]₅ and [Ni/Co]₅ multilayers

Tang

Ren

et al. 2017

RSC Adv.

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Anomalous scaling in surface roughness evaluation of electrodeposited nanocrystalline Pt thin films

Cited by 20 publications

References 28 publications

Surface Dynamics of SiO₂‐like Films on Polymers Grown by DBD Assisted CVD at Atmospheric Pressure

Surface Dynamics of SiO₂‐like Films on Polymers Grown by DBD Assisted CVD at Atmospheric Pressure

Intrinsic anomalous scaling in a ferromagnetic thin film model

Magnetic damping and perpendicular magnetic anisotropy in Pd-buffered [Co/Ni]₅ and [Ni/Co]₅ multilayers

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Anomalous scaling in surface roughness evaluation of electrodeposited nanocrystalline Pt thin films

Cited by 20 publications

References 28 publications

Surface Dynamics of SiO2‐like Films on Polymers Grown by DBD Assisted CVD at Atmospheric Pressure

Surface Dynamics of SiO2‐like Films on Polymers Grown by DBD Assisted CVD at Atmospheric Pressure

Intrinsic anomalous scaling in a ferromagnetic thin film model

Magnetic damping and perpendicular magnetic anisotropy in Pd-buffered [Co/Ni]5 and [Ni/Co]5 multilayers

Contact Info

Product

Resources

About

Surface Dynamics of SiO₂‐like Films on Polymers Grown by DBD Assisted CVD at Atmospheric Pressure

Surface Dynamics of SiO₂‐like Films on Polymers Grown by DBD Assisted CVD at Atmospheric Pressure

Magnetic damping and perpendicular magnetic anisotropy in Pd-buffered [Co/Ni]₅ and [Ni/Co]₅ multilayers