Anomalous Surface Diffusion in Nanoscale Direct Deposition Processes

Manandhar, Pradeep; Jang, Jae Won; Schatz, George C.; Ratner, Mark A.; Hong, Seok Hoon

doi:10.1103/physrevlett.90.115505

Cited by 114 publications

(106 citation statements)

References 23 publications

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“…Sub-diffusion characterises systems with spatial or temporal constraints, significantly slowing down the transport process, like in porous media [2], gels [3], polymer solutions [4] and living cells [5,6]. Super-diffusion arises when the system nature enables enhanced transport, like in turbulent flows [7,8] or catalytic surface reactions [9,10].…”

Section: Introductionmentioning

confidence: 99%

Linear Stability of Fractional Reaction - Diffusion Systems

Nec

Nepomnyashchy

2007

Math. Model. Nat. Phenom.

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Abstract. Theoretical framework for linear stability of an anomalous sub-diffusive activatorinhibitor system is set. Generalized Turing instability conditions are found to depend on anomaly exponents of various species. In addition to monotonous instability, known from normal diffusion, in an anomalous system oscillatory modes emerge. For equal anomaly exponents for both species the type of unstable modes is determined by the ratio of the reactants' diffusion coefficients. When the ratio exceeds its normal critical value, the monotonous modes become stable, whereas oscillatory instability persists until the anomalous critical value is also exceeded. An exact formula for the anomalous critical value is obtained. It is shown that in the short wave limit the growth rate is a power law of the wave number. When the anomaly exponents differ, disturbance modes are governed by power laws of the distinct exponents. If the difference between the diffusion anomaly exponents is small, the splitting of the power law exponents is absent at the leading order and emerges only as a next-order effect. In the short wave limit the onset of instability is governed by the anomaly exponents, whereas the ratio of diffusion coefficients influences the complex growth rates. When the exponent of the inhibitor is greater than that of the activator, the system is always unstable due to the inhibitor enhanced diffusion relatively to the activator. If the exponent of the activator is greater, the system is always stable. Existence of oscillatory unstable modes is also possible for waves of moderate length.

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Section: Introductionmentioning

confidence: 99%

Linear Stability of Fractional Reaction - Diffusion Systems

Nec

Nepomnyashchy

2007

Math. Model. Nat. Phenom.

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“…14 Our understanding of the role of the meniscus and water solvation of the molecules coating the tip suggests that as long as a compound has some solubility in water it should transport regardless of its melting temperature. 23 Figure 1B and Figure 4. This material is available free of charge via the Internet at http://pubs.acs.org.…”

Section: 22mentioning

confidence: 99%

Dip-Pen Nanolithography of High-Melting-Temperature Molecules

et al. 2006

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Direct nanopatterning of a number of high melting-temperature molecules have been systematically investigated by Dip-Pen Nanolithography (DPN). By tuning DPN experimental conditions, all of the high melting-temperature molecules transported smoothly from the AFM tip to the surface at room temperature without tip pre-heating. Water meniscus formation between the tip and substrate is found to play a critical role in patterning high melting-temperature molecules. These results show that heating an AFM probe to a temperature above the ink's melting temperature is not a prerequisite for ink delivery, which extends the current "ink-substrate" combinations, available to DPN users.

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“…1,5,6 With the advances in soft nanolithography using scanning probes or stamps, 7,8 SAMs with widths of 10-100 nm can be fabricated on a range of surfaces. 9 In the bulk SAM on a gold (111) surface, the adsorbed sulfur atoms develop a wellordered × R30 0 overlayer, even at room temperature. The alkyl chains were also ordered in orientation, tilting slightly (~30°) from the surface normal.…”

Section: Introductionmentioning

confidence: 99%

Nanoscale Islands of the Self Assembled Monolayer of Alkanethiol

Saha¹,

Yang²,

Jang

2013

Bulletin of the Korean Chemical Society

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Molecular dynamics simulations were performed to study the structure and stability of a nanoscale selfassembled monolayer (SAM) of alkanethiol on a gold (111) surface. The tilt angle and orientational order of the alkyl chains in the SAM island were examined by systematically varying the size of the island. The chain length dependence of the SAM island was examined by considering alkanethiols containing 12, 16, 20, and 24 carbon atoms. The minimum diameter of SAM islands made from 1-tetracosanethiol, 1-ecosanethiol, 1-hexadecanethiol and 1-dodecanethiol were 2.29, 1.9, 4.7 and 4.76 nm, respectively. These set the ultimate resolution that can be patterned by soft nanolithography. As the length of alkanethiol increases, the SAM islands became more ordered in both orientation and conformation of the alkyl chains.

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Anomalous Surface Diffusion in Nanoscale Direct Deposition Processes

Cited by 114 publications

References 23 publications

Linear Stability of Fractional Reaction - Diffusion Systems

Linear Stability of Fractional Reaction - Diffusion Systems

Dip-Pen Nanolithography of High-Melting-Temperature Molecules

Nanoscale Islands of the Self Assembled Monolayer of Alkanethiol

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