2018
DOI: 10.18844/gjapas.v0i9.3013
|View full text |Cite
|
Sign up to set email alerts
|

Anticorrosion behaviour of amorphous silicon-based coatings prepared by remote cold plasma-assisted chemical vapour deposition process

Abstract: Organosilicon films were deposited on carbon steel samples using remote microwave nitrogen plasma-assisted chemical vapour deposition. The deposits were obtained using TetraMethyDisoloxane monomer mixed with oxygen. The formed films were characterised using electron microprobe analysis, Fourier transformed infrared spectroscopy, contact angle measurements, scanning electron microscopy and atomic force microscopy. The electrochemical properties of the organosilicon coatings were evaluated using gravimetric expe… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Publication Types

Select...

Relationship

0
0

Authors

Journals

citations
Cited by 0 publications
references
References 21 publications
0
0
0
Order By: Relevance

No citations

Set email alert for when this publication receives citations?