Abstract:Organosilicon films were deposited on carbon steel samples using remote microwave nitrogen plasma-assisted chemical vapour deposition. The deposits were obtained using TetraMethyDisoloxane monomer mixed with oxygen. The formed films were characterised using electron microprobe analysis, Fourier transformed infrared spectroscopy, contact angle measurements, scanning electron microscopy and atomic force microscopy. The electrochemical properties of the organosilicon coatings were evaluated using gravimetric expe… Show more
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