Photomask Japan 2024: XXX Symposium on Photomask and Next-Generation Lithography Mask Technology 2024
DOI: 10.1117/12.3030657
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Applicability of projection exposure using a gradient-index lens array to thick resist patterning of more than 100-um

Toshiyuki Horiuchi,
Naoyuki Otsuka,
Takeharu Fukuhara Fukuhara
et al.
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