Conference Record of the Twenty-Fifth International Power Modulator Symposium, 2002 and 2002 High-Voltage Workshop.
DOI: 10.1109/modsym.2002.1189538
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Application of intense pulsed ion beam to materials processes

Katsumi Masugata
1
,
Kazuto Takao
2
,
M. Shiotani
3
et al.

Abstract: Intense pulsed ion beams (PIB) are expected to apply for material processes since they have unique features.To apply the PIB to materials processing two types of beam sources are Considered, i.e. plasma focus (PF) and pulsed power ion diode.

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