2008
DOI: 10.1117/12.760715
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Application of liquid crystal polymer films for photolithographic fabrication of 3D structures

Abstract: In this paper, we demonstrate a silicon etching application of a holographically formed polymer dispersed liquid crystal (H-PDLC) photomask. H-PDLC is a periodically nanostructured material consisting of stratified layers of polymer and liquid crystal. Due to the natural random alignment of the liquid crystal axes with respect to the polymer layers, an index of refraction mismatch exists and a reflection occurs. Application of bias across the film aligns the liquid crystals and eliminates the index mismatch ca… Show more

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