Abstract:Low‐energy noble‐gas ion scattering (LEIS) probes the outermost atomic layer of a material, but a quantitative compositional analysis of this layer is not straightforward. It is demonstrated that quantification by calibration can be done, assuming that ion fractions and shielding effects are the same for the reference sample and sample of interest. These assumptions are critically evaluated and LEIS experiments on binary alloys and metal oxides are presented that can partly verify these assumptions. The LEIS m… Show more
“…4, and used to determine the 18 O and 16 O sensitivity factors (g i ). 13 These values can be used as a reference to perform quantitative analysis on other 18 O-exchanged materials, provided that there are no matrix effects. Previous investigations of 3 He þ scattering by polydimethylsiloxane (PDMS) at energies from 800 eV to 5 keV showed a change in V c for O atoms in the E range of 800-1800 eV indicating a change in the dominant neutralization mechanism, 22 in agreement with the present work.…”
Section: Low-energy Ion Scattering (Leis) Is a Very Powerfulmentioning
confidence: 78%
“…9,11,12 Since several processes may occur during the scattering event, a quantitative prediction of the neutralization behaviour (e.g., P þ dependence on the primary ion energy) is required for the selection of the optimal experimental parameters to perform a reliable quantitative LEIS analysis while avoiding timeconsuming calibrations. 6,13,14 In this work, we used the characteristic velocity method in order to study the neutralization behaviour of 4 He þ scattered from 16 O and 18 O and to determine the elemental sensitivity factors. A silica sample has been chosen as a reference material since the preferential sputtering can be neglected at the low ion doses used for the analysis.…”
Section: Low-energy Ion Scattering (Leis) Is a Very Powerfulmentioning
Quantitative analysis in low-energy ion scattering (LEIS) requires an understanding of the charge-exchange processes to estimate the elemental sensitivity factors. In this work, the neutralization of He+ scattered by 18O-exchanged silica at energies between 0.6 and 7 keV was studied. The process is dominated by Auger neutralization for Ei < 0.8 keV. An additional mechanism starts above the reionization threshold. This collision-induced neutralization becomes the dominant mechanism for Ei > 2 keV. The ion fractions P+ were determined for Si and O using the characteristic velocity method to quantify the surface density. The 18O/16O sensitivity ratio indicates an 18% higher sensitivity for the heavier O isotope.
“…4, and used to determine the 18 O and 16 O sensitivity factors (g i ). 13 These values can be used as a reference to perform quantitative analysis on other 18 O-exchanged materials, provided that there are no matrix effects. Previous investigations of 3 He þ scattering by polydimethylsiloxane (PDMS) at energies from 800 eV to 5 keV showed a change in V c for O atoms in the E range of 800-1800 eV indicating a change in the dominant neutralization mechanism, 22 in agreement with the present work.…”
Section: Low-energy Ion Scattering (Leis) Is a Very Powerfulmentioning
confidence: 78%
“…9,11,12 Since several processes may occur during the scattering event, a quantitative prediction of the neutralization behaviour (e.g., P þ dependence on the primary ion energy) is required for the selection of the optimal experimental parameters to perform a reliable quantitative LEIS analysis while avoiding timeconsuming calibrations. 6,13,14 In this work, we used the characteristic velocity method in order to study the neutralization behaviour of 4 He þ scattered from 16 O and 18 O and to determine the elemental sensitivity factors. A silica sample has been chosen as a reference material since the preferential sputtering can be neglected at the low ion doses used for the analysis.…”
Section: Low-energy Ion Scattering (Leis) Is a Very Powerfulmentioning
Quantitative analysis in low-energy ion scattering (LEIS) requires an understanding of the charge-exchange processes to estimate the elemental sensitivity factors. In this work, the neutralization of He+ scattered by 18O-exchanged silica at energies between 0.6 and 7 keV was studied. The process is dominated by Auger neutralization for Ei < 0.8 keV. An additional mechanism starts above the reionization threshold. This collision-induced neutralization becomes the dominant mechanism for Ei > 2 keV. The ion fractions P+ were determined for Si and O using the characteristic velocity method to quantify the surface density. The 18O/16O sensitivity ratio indicates an 18% higher sensitivity for the heavier O isotope.
“…These surface densities have been estimated as (ρ • N Av / M) 2/3 , where ρ is the bulk density, N Av is Avogadro's number and M the molar mass. It has been shown before [22] …”
Section: Calibration Of the Leis Signalsmentioning
The role of the (001) crystallographic plane of the M1 phase of MoVTeNb mixed oxide catalysts in selective oxidation of propane to acrylic acid has been addressed by investigating a phase-pure M1 material preferentially exposing this surface. A model catalyst has been prepared by complete silylation of M1 followed by breakage of the SiO 2 covered needles. Using this approach, the reactivity of the M1 (001) surface has been investigated by combining a micro-reactor study of propane oxidation with High-Sensitivity Low Energy Ion Scattering (HS-LEIS). Scanning electron microscopy (SEM) and transmission electron microscopy (TEM) have been used to study shape and microstructure of the model system and to verify the surface exposure of the model catalyst. The specific formation rate of acrylic acid on the model catalyst is similar to that on the phase-pure M1 reference material indicating that the (001) plane of the M1 crystal structure does not possess enhanced catalytic properties compared to the lateral surface of M1 needles in propane oxidation.
“…where ni is the stoichiometric number of the element i in the compound (ni=1 for a single element), M is the molar mass of the compound (or element), and NAV is Avogadro's number. 341 The We assume a certain value for the N or O reference peak area and then we use this initial value to calculate all surface coverages for Ru grown either on SiN or on SiO2. Then, this value is recursively changed till the Vegard's condition is valid for all deposited thicknesses.…”
Section: Surface Coverages and Closed Layer Determination For Ru On Smentioning
confidence: 99%
“…341 Mass density values of 5.1±0.3, 5.7±0.3 and 2.3±0.3 g·cm -3 are determined from the respective fits to the XRR data of 10 nm-thick high-O ZrO2, low-O ZrO2 and aSi deposited samples, following the method described in Sec. 6 Fig.…”
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.