Application of X-rays to nanolithography

“2D or not 2D”: Shape-programming polymer sheets

“…[34,[57][58][59] There are also numerous low-cost, low-resolution patterning techniques, including, inkjet printing, screen printing, and roll-to-roll patterning. In addition, 3D shapes can be realized by, for example, stereolithography [60][61][62][63][64] or inkbased direct-write methods [65][66][67][68]. The examples given here are by no means comprehensive and are only given to suggest the wide range of patterning techniques available.…”

Foundations of Nanomechanics

“…At present, the most common industrial projection aligner is the I-line aligner, so named because it uses the A = 365 nm "I" wavelength ) lasers have been developed, and are now commercially available. Aresolution of 30 nm has been achieved using contact masks and x-rays from a synchrotron [124]. Researchers have also explored the use of x-rays, although sour ces with sufficiently large illumination aperture and collimation are extremely expensive to build; the best such source is an electron synchrotron, although plasma sour ces are being pursued as well.…”

Lithographic Imaging Techniques for the Formation of Nanoscopic Features

“…The optimal wavelength range for X-ray lithography is dependent on resist sensitivity, mask transparency, and diffraction effects 85 and is usually regarded to be between 0.8 and 1.4 nm . At wavelengths this short, even the all-reflective optical systems used in EUV are not practical, hence proximity printing is the only alternative.…”