Applying RF current harmonics for end-point detection during etching multi-layered substrates and cleaning discharge chambers with NF3 discharge

Lisovskiy, Valeriy; Booth, Jean‐Paul; Landry, K.; Douai, D.; Cassagne, V.; Yegorenkov, Vladimir

doi:10.1016/j.vacuum.2007.04.035

Cited by 9 publications

(4 citation statements)

References 52 publications

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“…Since higher harmonics sensitively react to plasma parameters such as electron concentration and collision frequency or discharge asymmetry, they can be used for monitoring plasma processes. They are used, e.g., for monitoring the end-point detection of etching processes [15,16], monitoring the compound layer on magnetron targets [17,18] or dust growth [19][20][21] and for the measurement of electron concentration and collision frequency [22].…”

Section: Introductionmentioning

confidence: 99%

Modelling of electric characteristics of capacitively coupled discharges including nonlinear effects of sheaths

Dvořák¹

2013

Plasma Sources Sci. Technol.

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Electric characteristics of capacitively coupled discharges were calculated, including their nonlinear behaviour and generation of higher harmonic frequencies of discharge current and voltage. The discharge was modelled as a series combination of the bulk plasma, two nonlinear sheaths and a radio frequency generator. Comparison of the results of the model with an experiment is discussed. The model was used for studying the waveforms of discharge current and sheath voltages and generation of higher harmonic frequencies at a wide range of discharge parameters. Coupling of higher harmonic frequencies, discharge asymmetry and discharge voltage was demonstrated. The effects of plasma-sheath resonance and other phenomena on the discharge behaviour were shown.

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Section: Introductionmentioning

confidence: 99%

Modelling of electric characteristics of capacitively coupled discharges including nonlinear effects of sheaths

Dvořák¹

2013

Plasma Sources Sci. Technol.

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“…The complex process of creation and damping of higher harmonic frequencies results in a sensitive reaction of higher harmonics to changes in plasma parameters which can be used for diagnostic purposes. They are used for the detection of dust growing in the plasma [8][9][10], determination of the end of an etching process [11,12], monitoring of a compound layer on the magnetron target [13,14] or measurement of electron concentration and collisional frequency [15].…”

Section: Introductionmentioning

confidence: 99%

Monitoring of PVD, PECVD and etching plasmas using Fourier components of RF voltage

Dvořák¹,

Vašina²,

Buršı́ková³

et al. 2010

Plasma Phys. Control. Fusion

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Fourier components of discharge voltages were measured in two different reactive plasmas and their response to the creation or destruction of a thin film was studied. In reactive magnetron sputtering the effect of transition from the metallic to the compound mode accompanied by the creation of a compound film on the sputtered target was observed. Further, deposition and etching of a diamond-like carbon film and their effects on amplitudes of Fourier components of the discharge voltage were studied. It was shown that the Fourier components, including higher harmonic frequencies, sensitively react to the presence of a film. Therefore, they can be used as a powerful tool for the monitoring of deposition and etching processes. It was demonstrated that the behaviour of the Fourier components was caused in both experiments by the presence of the film. It was not caused by changes in the chemical composition of the gas phase induced by material etched from the film or decrease in gettering rate. Further, the observed behaviour was not affected by the film conductivity. The behaviour of the Fourier components can be explained by the difference between the coefficients of secondary electron emission of the film and its underlying material.

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“…The fact that the amplitude of higher harmonic frequencies depends on electron concentration is important for an explanation of some monitoring techniques that are used in deposition or etching processes. Higher harmonics are used for end-point detection of etching processes [15][16][17] and for detection of mode transition in reactive magnetron sputtering [17,18]. Both these monitoring techniques rely on the sensitive reaction of higher harmonic frequencies on electron concentration, whether its behaviour is controlled by surface processes or volume ionization [17,19].…”

Section: Examples Of Measured Waveformsmentioning

confidence: 99%

Probe technique for measurement of a plasma potential waveform

Dvořák¹,

Tkáčik²,

Bem³

2017

Plasma Sources Sci. Technol.

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A method for the measurement of plasma potential waveforms is presented that is based on measurement with a high-impedance probe and an electric model of the sheath around the probe. The method was verified and compared with methods that were previously used for measurement of the temporal development of plasma potential during an RF period of capacitive discharges. The sensitivity of the method to the values of required input parameters (mean plasma potential value, electron concentration and temperature) was analyzed and it was found that with a lower precision, the method can be used even without the knowledge of these input parameters. Finally, plasma potential waveforms were measured in a low-pressure capacitively coupled discharge. In agreement with theoretical models, the generation of higher harmonic frequencies of plasma potential and their sensitivity to electron concentration were observed.

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Applying RF current harmonics for end-point detection during etching multi-layered substrates and cleaning discharge chambers with NF3 discharge

Cited by 9 publications

References 52 publications

Modelling of electric characteristics of capacitively coupled discharges including nonlinear effects of sheaths

Modelling of electric characteristics of capacitively coupled discharges including nonlinear effects of sheaths

Monitoring of PVD, PECVD and etching plasmas using Fourier components of RF voltage

Probe technique for measurement of a plasma potential waveform

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