Approaching Nanoxerography: The Use of Electrostatic Forces to Position Nanoparticles with 100 nm Scale Resolution

Jacobs, Heiko O.; Campbell, Stephen A.; Steward, Michael G

doi:10.1002/1521-4095(20021104)14:21<1553::aid-adma1553>3.0.co;2-9

Cited by 121 publications

(111 citation statements)

References 4 publications

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“…We refer to this process as electric nanocontact printing of charge. The electrode structures used in electric nanocontact printing are made from lithographically patterned thin silicon (10 µm thick) wafers [14] and metal coated poly(dimethylsiloxane) (PDMS) stamps [1,9]. For the dielectric substrate, we used a 60 nm thick film of PMMA spin coated onto a silicon wafer.…”

Section: Methodsmentioning

confidence: 99%

“…A number of concepts have been developed to print nanoparticles directly from powder and solution. Sub -one micrometer resolution assembly has been accomplished using charge directed nanoxerographic printing [1,2] and topographically directed assembly incorporating both capillary and electrostatic forces [3,4]. While the solution methods have emerged, directed self-assembly processes from the gas phase are not widely available but immensely important.…”

Section: Introductionmentioning

confidence: 99%

“…The nanomaterial building blocks would not have to be transferred in solution as is currently the case. Solution concepts have their own set of problems -almost all of the reviewed receptor based assembly concepts [1,2,[5][6][7][8][9][10][11][12][13] require surface functionization to prevent agglomeration or to guide the assembly which often interferes with the electronic or optical properties. Direct integration from the gas phase would support the use of well established passivation concepts to create high quality nanomaterial building blocks that maintain the electronic and optoelectronic functionality.…”

Section: Introductionmentioning

confidence: 99%

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Gas Phase Nanoparticle Integration

2007

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We report on two gas phase nanoparticle integration processes to assemble nanomaterials onto desired areas on a substrate. We expect these processes to work with any material that can be charged. The processes offer selfaligned integration and could be applied to any nanomaterial device requiring site specific assembly. The Coulomb force process directs the assembly of nanoparticles onto charged surface areas with sub-100 nm resolution. The charging is accomplished using flexible nanostructured electrodes. Gas phase assembly systems are used to direct and monitor the assembly of nanoparticles onto the charge patterns with a lateral resolution of 50 nm. The second concept makes use of fringing fields. The fringing fields directed the assembly of nanoparticles into openings. The fringing fields can be confined to sub 50 nm sized areas and exceed 1 MV/m, acting as nanolenses. Gas phase assembly systems have been used to deposit silicon, germanium, metallic, and organic nanoparticles.

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Section: Methodsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Gas Phase Nanoparticle Integration

2007

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“…Several methods have been employed to produce deposition of nanoparticles on a surface using the atomic force microscope (AFM) tip in order to apply pulses of voltage into an insulating films [5,6], printing technique that uses electrostatic force to pattern PMMA (polymethyl methacrylate) [7], electrostatic force generated by p-n junction [8] and lithography process that uses conductive flexible poly-dimethyl-siloxane (PDMS) stamp to create charged substrates [9]. Another common method uses a poly-L-lysine (PLL) which is a positive organic layer in order to coat the substrate and make an intermediary between the negative nanoparticles and the substrate.…”

Section: Introductionmentioning

confidence: 99%

Tunable nano devices fabricated by controlled deposition of gold nanoparticles via focused ion beam

Shahmoon

Limon

Girshevitz

et al. 2010

Microelectronic Engineering

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a b s t r a c tIn this paper, we present the fabrication procedures as well as the preliminary experimental results of a novel method for significantly simplified deposition of charged nanoparticles at specific patterns based on focused ion beam (FIB) technology. The deposition method relies on the implantation of positive gallium ions on an insulated material which creates the basis for attracting the nanoparticles to the substrate. In order to substantiate the theory two patterns were generated on a silicon on insulator (SOI) chip with an upper layer of silicon of 200 nm. The two patterns are as follows: resolution target -consisting of six squares and 400 nm Â 400 nm circular sinusoidal tunnel. In addition, we demonstrate the utilization and applicability of the aforementioned method in a tunable radiation nano device as well as show its experimental characterization.

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“…22 In our own research we have developed a parallel charge patterning process enabling nanoxerographic printing. [12][13][14][15] Patterning of charge with 100-200 nm resolution and transfer of 50 nm to 20 µm sized particles including silver, gold, indium, iron oxide, graphitized carbon, iron beads, and Xerox toner from a powder, gas, and liquid phase [12][13][14][15] has been accomplished. …”

mentioning

confidence: 99%

Charging Process and Coulomb-Force-Directed Printing of Nanoparticles with Sub-100-nm Lateral Resolution

Barry

Jacobs

2005

Nano Lett.

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This article reports on a new charging process and Coulomb-force-directed assembly of nanoparticles onto charged surface areas with sub-100-nm resolution. The charging is accomplished using a flexible nanostructured thin silicon electrode. Electrical nanocontacts have been created as small as 50 nm by placing the nanostructured electrode onto an electret surface. The nanocontacts have been used to inject charge into 50 nm sized areas. Nanoparticles were assembled onto the charge patterns, and a lateral resolution of 60 nm has been observed for the first time. A comparison of the nanoparticle patterns with the surface potential distribution recorded by Kelvin probe force microscopy (KFM) revealed a mismatch in the lateral resolution. One possible explanation is that nanoparticles may visualize charge patterns at a sub-60-nm length scale that is not well resolved using KFM.Inorganic, metallic, and semiconducting nanomaterials in the form of nanoparticles, nanowires, nanobelts, or nanodisks are considered key building blocks in the design of novel high-performance nanotechnological devices. The process to fabricate such devices, however, will require new additive concepts to integrate, orient, and assemble such building blocks at desired locations on a substrate. Current approaches that address the integration of nanomaterials at desired locations on a substrate include serial scanning probe based concepts to print 1,2 or manipulate 3 nanomaterials at the sub-100-nm length scale, semiparallel inkjet-based concepts 4,5 to print materials from suspensions with 10 µm scale resolution, parallel nanotransfer methods 6,7 to transfer nanomaterials from one substrate to another retaining a copy of the order, and a vast variety of programmable or "receptor based" assembly concepts 8-18 that use unordered nanomaterials as an input. Scanning probe and inkjet-based methods enable rapid reconfiguration of the patterns and the formation of heterogeneous assemblies at an early stage but remain too slow to print materials over large areas at the sub-10-µm length scale. Nanotransfer concepts are most suitable to transfer nanomaterials from one substrate to another over large areas. Nanotransfer maintains the arrangement of the nanomaterials on a donor substrate; i.e., it does not order or rearrange the materials as part of the process."Receptor"-based concepts focus on the directed assembly of randomly oriented nanomaterials. The materials are suspended in solution or gas phase and are assembled at desired locations (receptors) on a substrate using specific interactions. Most actively investigated areas, currently, use protein recognition, 19,20 DNA hybridization,9,21,22 hydrophobicity/hydrophilicity, surface tension and self-assembled monolayers, 10 topography-directed concepts, 23-25 magnetic 11 and dielectrophoretic assembly and transport, 22,[26][27][28] and electrostatic forces. [12][13][14][15][16][17][18]25,27 In recent years there has been an increased focus on the use of long range electrostatic forces to direct th...

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Approaching Nanoxerography: The Use of Electrostatic Forces to Position Nanoparticles with 100 nm Scale Resolution

Cited by 121 publications

References 4 publications

Gas Phase Nanoparticle Integration

Gas Phase Nanoparticle Integration

Tunable nano devices fabricated by controlled deposition of gold nanoparticles via focused ion beam

Charging Process and Coulomb-Force-Directed Printing of Nanoparticles with Sub-100-nm Lateral Resolution

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