2014
DOI: 10.1103/physrevapplied.1.034006
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Approaching the Trap-Free Limit in Organic Single-Crystal Field-Effect Transistors

Abstract: We present measurements of rubrene single crystal field-effect transistors with textbooklike transfer characteristics, as one would expect for intrinsically trap-free semiconductor devices. Particularly, the high purity of the crystals and the defect-free interface to the gate dielectric are reflected in an unprecedentedly low subthreshold swing of 65 mV/decade, remarkably close to the fundamental limit of 58.5 mV/decade. From these measurements we quantify the residual density of traps by a detailed analysis … Show more

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Cited by 85 publications
(56 citation statements)
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“…Judging from the comparison between C 8 -DNBDT-NW OFETs situated with (i) and (ii), trap DOS is apparently influenced by the quality of semiconductor/ dielectric interface; random potential, which may be induced by imperfection of surface treatment of dielectric interface, can be a major impediment not only for solution crystallization, but also for charge transport. Given the fact that the trap DOS for rubrene single crystals grown by physical vapor transport is measured to be significantly lower 41 , residual solvent may induce additional traps in our solution-processed crystalline films. However, in recent synchrotron X-ray diffraction measurements, we do not see any trapped solvent molecules in the bulk crystal structure of C 8 -DNBDT-NW 8 .…”
Section: Resultsmentioning
confidence: 99%
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“…Judging from the comparison between C 8 -DNBDT-NW OFETs situated with (i) and (ii), trap DOS is apparently influenced by the quality of semiconductor/ dielectric interface; random potential, which may be induced by imperfection of surface treatment of dielectric interface, can be a major impediment not only for solution crystallization, but also for charge transport. Given the fact that the trap DOS for rubrene single crystals grown by physical vapor transport is measured to be significantly lower 41 , residual solvent may induce additional traps in our solution-processed crystalline films. However, in recent synchrotron X-ray diffraction measurements, we do not see any trapped solvent molecules in the bulk crystal structure of C 8 -DNBDT-NW 8 .…”
Section: Resultsmentioning
confidence: 99%
“…Black lines represent those computed from transfer characteristics (see Supplementary Note 6). The error bars represent compound errors that result from propagation of the uncertainties in S I D =I 2 D and transconductance the transport level as follows 41 ; Given the Debye length λ D ¼ ffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffi ϵk B T=ne 2 p À Á , where ϵ is the permittivity of the organic semiconductor, the drain current (I D ) can be written as:…”
Section: Methodsmentioning
confidence: 99%
“…Moreover, rubrene shows high singlet fission efficiencies in both, single crystals 22,23 and amorphous thin films 24 . Rubrene became thus a model system to study intermolecular interactions and charge transport properties of molecular solid states 10,20,21,[25][26][27][28][29][30][31] . The outstanding charge transport properties might be related to the peculiar molecular structure of rubrene with the frontier orbitals mainly located on the tetracene backbone and the electronically inactive phenyl side groups 28,[32][33][34] .…”
Section: Introductionmentioning
confidence: 99%
“…For practical applications, a subthreshold swing (S), which is the inverse of the logarithmic slope of the drain current (I D ) versus gate voltage (V G ) in the subthreshold regime, is an important characteristic in addition to the mobility. 28 In fact, the devices with smaller S can be operated by lower V G . Given the assumption that the trap density in the bulk is zero, the trap density at the interface per unit area (D it ) can be estimated as follows:…”
mentioning
confidence: 99%
“…Note that S is related to the deep trap at the interface. 28 Table II summarizes the averaged S and D it of three devices: for the device only with SAM, for the one with PMMA and SAM, and for the one only with PMMA (Transistor characteristics of typical devices are shown in Figure S1 in the supplementary material). Here again, the value of 34.5 nF cm À2 was used as C i in all types of devices.…”
mentioning
confidence: 99%