Aqueous Base Developed, Single Level Resist For Submicron X-Ray Lithography

Abstract

The x -ray lithographic performance of a new, experimental negative acting, single level resist has been investigated. Unlike other negative x -ray resists, which are solvent developed, the new resist is developed with aqueous base.This results in very low image swelling and allows high resolution, high aspect ratio, negative resist images to be obtained with a conventional palladium anode x -ray source of wavelength 4.37 A.