Metrology, Inspection, and Process Control for Microlithography XVIII 2004
DOI: 10.1117/12.534102
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Are ambient SO 2 levels a valid indicator of projected acid gas filter life?

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Cited by 3 publications
(2 citation statements)
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“…Significant reductions of NO x were observed upon exposure of these medias to approximately 500 ppbv NO x . 12,16 Los Alamos National Lab (LANL) has shown that fuel cell life and power can be significantly improved using our AGR media when exposed to 5.0 ppmv of NO 2 . 12 IMEC and DIONEX have combined to show that in 193 nm Lithography applications our AGR filters are effective at reducing SO 2 levels from ~1.0 ppbv to <5.0 pptv (>99.5% efficiency), NO from ~2.0 ppbv to 25 pptv (98.5% efficiency), while maintaining NO 2 levels below 10 pptv.…”
Section: Packed Bed Filter Breakthrough Testingmentioning
confidence: 98%
“…Significant reductions of NO x were observed upon exposure of these medias to approximately 500 ppbv NO x . 12,16 Los Alamos National Lab (LANL) has shown that fuel cell life and power can be significantly improved using our AGR media when exposed to 5.0 ppmv of NO 2 . 12 IMEC and DIONEX have combined to show that in 193 nm Lithography applications our AGR filters are effective at reducing SO 2 levels from ~1.0 ppbv to <5.0 pptv (>99.5% efficiency), NO from ~2.0 ppbv to 25 pptv (98.5% efficiency), while maintaining NO 2 levels below 10 pptv.…”
Section: Packed Bed Filter Breakthrough Testingmentioning
confidence: 98%
“…Over the years, the AMC contaminants of greatest concern in photolithography applications have changed dramatically. Since the early 1990s the focus of AMC filtration has ranged from ammonia (NH3), 1,2 n-methyl-2-pyrrolidinone (NMP), 3,4 amines, 5 sulfur dioxide (SO2) 6 and acid gases in general, 7 to siloxanes (HMDS, HMDSO, and TMS). 8,9 The issues associated with these contaminants have ranged from photoresist issues (e.g.…”
Section: Introductionmentioning
confidence: 99%