We present a stochastic model which simulates electromigration damage in
metallic interconnects by biased percolation of a random resistor
network in the presence of degradation and recovery processes.
The main features of experiments including Black's law, times to failure
distribution, current threshold for the onset of electromigration,
etc are properly reproduced.
Compositional effects showing up in early resistance changes measured
on Al-0.5%Cu and Al-1%Si lines are also studied.