Argon gas concentration effects on nanostructured molybdenum nitride layer growth using 100 Hz pulsed dc glow discharge

Ikhlaq, Uzma; Ahmad, Riaz; Saleem, Shemaila; Shah, Miral; Khan, Nasrullah; Khalid, Nida

doi:10.1051/epjap/2012120173

Cited by 9 publications

(8 citation statements)

References 43 publications

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“…Thus nitridation, nucleation of silicon nitride and its growth change the surface roughness even with increasing argon contents (sputtering rate). Moreover, the smoothing and roughening of surface layers depend on several factors such as coalescence, crystallite size, residual stresses, layer thickness, etc., resulting from the interaction of energetic nitrogen-argon plasma [26]. From the above results it is concluded that the surface properties of silicon nitride films can be controlled just by controlling the argon contents in nitrogen-argon plasma.…”

Section: Sem Analysismentioning

confidence: 73%

Role of argon plasma on the structural and morphological properties of silicon nitride films by pulsed DC glow discharge

Abbas

Ahmad

Khan³

et al. 2013

2013 International Conference on Aerospace Science &Amp; Engineering (ICASE)

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The role of argon gas concentration on silicon nitride layer formation by using Pulsed dc glow discharge is investigated by exposing Si (100) to different N 2 /Ar plasma for 4 hrs at 2 mbar pressure and 175 W power. XRD results show the development of different planes of silicon nitride which confirms the formation of silicon nitride films. The peak broadening, overlapping and shifting from their stress free values are attributed to the argon nitrogen plasma concentrations. SEM results show the formation of nitride film. AFM images shows that silicon nitride films are rough in nature and their roughness is increased with argon. Maximum surface roughness is observed for 20% argon while minimum surface roughness is observed at 10% argon content in nitrogen-argon plasma.

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Section: Sem Analysismentioning

confidence: 73%

Role of argon plasma on the structural and morphological properties of silicon nitride films by pulsed DC glow discharge

Abbas

Ahmad

Khan³

et al. 2013

2013 International Conference on Aerospace Science &Amp; Engineering (ICASE)

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“…Finally, the samples are cleaned in ultrasonic bath and then cleaned with acetone. [18] X-ray diffraction (XRD) patterns are obtained by an X'Pert PRO MPD θ -2θ X-ray diffractometer operated at a voltage of 40 kV and current of 40 mA and using CuK α (λ = 1.5406) Å radiation. The surface morphology of the nitrided specimens are investigated with a (HITACHI S-3400 N) scanning electron microscope.…”

Section: Methodsmentioning

confidence: 99%

Nitriding molybdenum: Effects of duration and fill gas pressure when using 100-Hz pulse DC discharge technique

et al. 2014

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Molybdenum is nitrided by a 100-Hz pulsed DC glow discharge technique for various time durations and fill gas pressures to study the effects on the surface properties of molybdenum. X-ray diffractometry (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM) are used for the structural and morphological analysis of the nitrided layers. Vickers' microhardness tester is utilized to investigate surface microhardness. Phase analysis shows the formation of more molybdenum nitride molecules for longer nitriding durations at fill gas pressures of 2 mbar and 3 mbar (1 bar = 10 5 Pa). A considerable increase in surface microhardness (approximately by a factor of 2) is observed for longer duration (10 h) and 2-mbar pressure. Longer duration (10 h) and 2-mbar fill gas pressure favors the formation of homogeneous, smooth, hard layers by the incorporation of more nitrogen.

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“…The ablated Zr atoms chemically react with atoms of the surrounding gas (oxygen/hydrogen) and redeposit on the target surface after the formation of oxides and hydrides. Formation of theses oxides and hydrides is attributable for the decrease in crystallite size [22]. The possible defect production and growth of residual stresses might also be considered to be other reasons for decrease in the crystallite size [22].…”

Section: Laser Ablation -From Fundamentals To Applicationsmentioning

confidence: 99%

“…Formation of theses oxides and hydrides is attributable for the decrease in crystallite size [22]. The possible defect production and growth of residual stresses might also be considered to be other reasons for decrease in the crystallite size [22]. An increase in stacking faults and structural disorder owing to the diffusion of hydrogen/oxygen widens the XRD peaks [23].…”

Section: Laser Ablation -From Fundamentals To Applicationsmentioning

confidence: 99%

Structural Modifications of KrF Excimer Laser-Ablated Zirconium Correlated to the Surface and Mechanical Properties

Ali¹,

Umm-i-Kalsoom²,

Bashir³

et al. 2017

Laser Ablation - From Fundamentals to Applications

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The structural modifications of KrF excimer laser-ablated zirconium (Zr) have been investigated in correlation with its surface and mechanical properties after ablation in deionized water and ethanol. KrF excimer laser of pulse duration of 20 ns, wavelength of 248 nm, and repetition rate of 20 Hz has been utilized for this purpose. Irradiation of Zr was carried out for varying number of laser pulses ranging from 500 to 2000 for laser fluence value of 3.6 J/cm 2 . The structural and chemical analyses were performed by using X-ray diffraction (XRD), Raman spectroscopy, and energy dispersive X-ray spectroscopy (EDS) techniques. Scanning electron microscope (SEM) and Vickers hardness tester were utilized for the analysis of surface morphology and hardness of laser-irradiated Zr targets. Presence of surrounding liquids played substantial role in structural, chemical, and mechanical modifications of Zr targets after irradiation. Pressure gradients and convective bubble motion owing to the confinement effects of the surrounding liquids, several thermal and chemical phenomena produced by heating through laser at the solid-liquid interface results in the generation of various hydrides and oxides of Zr, which are responsible for the development of various surface features and increase in hardness of irradiated Zr.

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Argon gas concentration effects on nanostructured molybdenum nitride layer growth using 100 Hz pulsed dc glow discharge

Cited by 9 publications

References 43 publications

Role of argon plasma on the structural and morphological properties of silicon nitride films by pulsed DC glow discharge

Role of argon plasma on the structural and morphological properties of silicon nitride films by pulsed DC glow discharge

Nitriding molybdenum: Effects of duration and fill gas pressure when using 100-Hz pulse DC discharge technique

Structural Modifications of KrF Excimer Laser-Ablated Zirconium Correlated to the Surface and Mechanical Properties

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