Arrayed microcolumn operation with a wafer-scale Einzel lens

Kim, Ho‐Seob; Kim, Daewook; Ahn, Seungjoon; Kim, Young Chul; Cho, Jaewon; Choi, Sang-Kook; Kim, Dae-Yong

doi:10.1016/j.mee.2004.12.092

Cited by 9 publications

(2 citation statements)

References 8 publications

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“…The advantage of the microcolumn is that it is created with arrayed column structures in three ways: a combination of single columns, monolithic columns, and wafer-scale columns. 2) Several kinds of discrete arrayed-microcolumns have been fabricated by arranging multiple microcolumns, and the preliminary research of monolithic and wafer-scale integrated microcolumns has been advanced to achieve high throughput, 2,[16][17][18][19][20][21][22][23] and the concept is schematically described in Fig. 5.…”

Section: Multiple Microcolumn Systemmentioning

confidence: 99%

Development of arrayed microcolumns and field emitters

Kim

Lee

Choi

et al. 2017

Jpn. J. Appl. Phys.

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Electron beam devices have been widely used for inspection or lithography processes. The multibeam technology based on arrayed microcolumns has been developed to overcome the low throughput issue. However, the multicolumn system has some drawbacks such as complexity, electron optics, and electron source. The first drawback is the difficulty in multicolumn assembly. In particular, the alignment process of a source lens and a tip requires sophisticated techniques. The second drawback is that the e-beam characteristics of microcolumns constituting the multicolumn differ from column to column. To solve the first drawback, a sub-5-nm-resolution probe beam optic design with a simple structure and a two-dimensional carbon nanotube (2D-CNT) electron emitter instead of the widely used tungsten field emitter tip have been studied.

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Section: Multiple Microcolumn Systemmentioning

confidence: 99%

Development of arrayed microcolumns and field emitters

Kim

Lee

Choi

et al. 2017

Jpn. J. Appl. Phys.

Self Cite

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“…However, the measurements are a slow process as the SEM scans the object using an electron beam. To eliminate this drawback, a miniature and potentially portable SEM with small column dimensions or a multiple column arrangement has been developed [5,6], but it suffers from poor resolution.…”

Section: Introductionmentioning

confidence: 99%

Design and fabrication of a scanning electron microscope using a finite element analysis for electron optical system

et al. 2008

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In this paper, we describe the design and fabrication of a thermionic scanning electron microscope (SEM) and examine its characteristics analytically. In the design process, the dimensions and capacity of the SEM components, such as the electron column, lenses, and apertures, were determined using finite element analysis. All components were integrated systematically during fabrication in order to achieve the maximum performance by adjusting the lens parameters, high voltage source, and image calibration methods. As a result, a thermionic SEM image with high resolution was achieved. We discuss the primary considerations required to achieve a high-performance image.

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Low energy electron beam microcolumn lithography

Kim

et al. 2006

Microelectronic Engineering

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Arrayed microcolumn operation with a wafer-scale Einzel lens

Cited by 9 publications

References 8 publications

Development of arrayed microcolumns and field emitters

Development of arrayed microcolumns and field emitters

Design and fabrication of a scanning electron microscope using a finite element analysis for electron optical system

Low energy electron beam microcolumn lithography

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