2010
DOI: 10.1016/j.mee.2009.08.015
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Arrays of metallic nanocones fabricated by UV-nanoimprint lithography

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Cited by 41 publications
(47 citation statements)
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“…The gold nanostructures (nanoCones array) over Si substrates were modeled with structural geometry such as base and height of the cone are fixed to 180 and 110 nm, respectively. The electric field distribution for the nanoCone structure was 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 45 46 47 48 49 50 51 52 53 54 55 56 57 58 59 60 electric field over the apex of the cone in accordance with the report in the past 28,48 . In this case, the confined electric field at the apex of the cone is around 20 with respect to the incident.…”
Section: Resultssupporting
confidence: 87%
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“…The gold nanostructures (nanoCones array) over Si substrates were modeled with structural geometry such as base and height of the cone are fixed to 180 and 110 nm, respectively. The electric field distribution for the nanoCone structure was 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 45 46 47 48 49 50 51 52 53 54 55 56 57 58 59 60 electric field over the apex of the cone in accordance with the report in the past 28,48 . In this case, the confined electric field at the apex of the cone is around 20 with respect to the incident.…”
Section: Resultssupporting
confidence: 87%
“…This technique facilitates the fabrication of nanostructures with the spatial resolution down to sub 10 nm, keeping the fabrication cost and production time significantly low. Various nanostructures, fabricated using this technique, and following UV curing of polymers, were reported with limited application of the device [28][29][30] . Very few reports can be found which are related to the 3D nanostructured devices, fabricated by direct NIL technique [31][32] and their spectroscopic properties.…”
Section: Introductionmentioning
confidence: 99%
“…Fig. 19 shows arrays of gold nanocones that have been fabricated using UV-NIL for plasmonic sensing applications [71]. Nanocones are 130 nm in base diameter and are ordered in a square grid with a 300-nm period.…”
Section: Fabricationmentioning
confidence: 99%
“…The period is 300 nm, the cone bottom diameter is 130 nm, and the average height is 257 nm (Ti/Au 20/230 nm). The proposed method can be used to fabricate a variety of plasmonic metallic structures [71]. …”
Section: Figmentioning
confidence: 99%
“…The signal detected (scattering cross-section) will have the resonant wavelength position, magnitude and bandwidth depending on the electromagnetic characteristics of the overall system "sensor-MUT". In particular, this sensor consists of gold conical nanoparticles arranged in an array configuration, deposited on a SiO 2 substrate as shown in The possibility to implement metallic cones on flat dielectric substrates is well established in literature, several kind of fabrication techniques are possible, for example: nano-imprint lithography and electron beam evaporation [33], electron beam induced deposition [34], templating approach [35] and nanotransfer printing (nTP) method [36].…”
Section: The Nanocone-based Sensormentioning
confidence: 99%