2004
DOI: 10.1063/1.1821649
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Arrays of nanoscale magnetic dots: Fabrication by x-ray interference lithography and characterization

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Cited by 91 publications
(47 citation statements)
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“…Although optical lithography has high throughput, the smallest size of features that can be produced is limited by the long optical wavelength. Among many nanofabrication methods, [10][11][12][13][14][15] a promising technique is based on masks with sub-100-nm self-assembled pores. Such masks, for example, can be fabricated by the anodization of aluminum under appropriate experimental conditions.…”
Section: Introductionmentioning
confidence: 99%
“…Although optical lithography has high throughput, the smallest size of features that can be produced is limited by the long optical wavelength. Among many nanofabrication methods, [10][11][12][13][14][15] a promising technique is based on masks with sub-100-nm self-assembled pores. Such masks, for example, can be fabricated by the anodization of aluminum under appropriate experimental conditions.…”
Section: Introductionmentioning
confidence: 99%
“…With nonlinear spatial frequency multiplication techniques, this limit can be reduced by factors of 1/2, 1/3, etc.-extending well into the nanoscale regime. Soft X-ray IL using synchrotron radiation has been performed as well [188][189][190]. The theoretical limit was about 3 nm.…”
Section: Other Methodologiesmentioning
confidence: 99%
“…The technology of fabrication of MDAs [10,11,12,13] has been perfected to an excellent degree in the past few years. In practice, however, an occurrence of technological defects and local irregularities has still a great influence on all of the magnetic properties [14].…”
Section: Introductionmentioning
confidence: 99%