2020
DOI: 10.1016/j.jmrt.2020.09.045
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Artifact-free microstructures of the Cu–In reaction by using cryogenic broad argon beam ion polishing

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Cited by 12 publications
(8 citation statements)
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“…Figure 3 shows the cross-sectional microstructure of the as-bonded Cu/In interface after soldering at 180 °C for 30 s followed by water quenching. Consistent with our previous study [ 15 ], a two-phase layer and some heterogeneously precipitated faceted Cu 11 In 9 particles formed at the Cu/In interface. The two-phase layer comprised Cu 11 In 9 and In, where In corresponded to the dark areas produced when argon gas removed the soft In surrounded by tough Cu 11 In 9 during ion polishing.…”
Section: Resultssupporting
confidence: 93%
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“…Figure 3 shows the cross-sectional microstructure of the as-bonded Cu/In interface after soldering at 180 °C for 30 s followed by water quenching. Consistent with our previous study [ 15 ], a two-phase layer and some heterogeneously precipitated faceted Cu 11 In 9 particles formed at the Cu/In interface. The two-phase layer comprised Cu 11 In 9 and In, where In corresponded to the dark areas produced when argon gas removed the soft In surrounded by tough Cu 11 In 9 during ion polishing.…”
Section: Resultssupporting
confidence: 93%
“…These islands gradually joined together and became a thick and continuous Cu 11 In 9 layer after 2000 h of aging, as illustrated in Figure 4 h,j. Since the original Cu/In interface was between the faceted Cu 11 In 9 particles and the two-phase layer [ 15 ], the growth front of the continuous Cu 11 In 9 layer was observed to be at the Cu side, indicating that In was the dominant diffusion species in the Cu/In system at 100 °C. Accordingly, In atoms diffused across the continuous CuIn 2 and Cu 11 In 9 layers to react with Cu and formed new Cu 11 In 9 .…”
Section: Resultsmentioning
confidence: 99%
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“…However, during mechanical polishing, the silicon carbide particles on the sandpaper and diamond abrasives in the polishing fluid were embedded in the soft In-Sn alloy. It has been reported that ion milling can be used in place of mechanical polishing for samples that are damaged by mechanical polishing [24]. An ion milling system (Hitachi, IM4000Plus, Tokyo,…”
Section: Cross-section Observation and Ion Millingmentioning
confidence: 99%