2020
DOI: 10.1021/acs.jpcc.0c05250
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Artificial Neural Network Discrimination for Parameter Estimation and Optimal Product Design of Thin Films Manufactured by Chemical Vapor Deposition

Abstract: Industrial production of valuable chemical products often involves the manipulation of phenomena evolving at different temporal and spatial scales. Product properties can be captured accurately using computationally expensive stochastic multiscale models that explicitly consider the feedbacks between different scales. However, product design quality is often tampered by uncertainties affecting process operation. In this work, we used artificial neural networks (ANNs) to estimate an uncertain parameter, accurat… Show more

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Cited by 23 publications
(10 citation statements)
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“…Besides 2D materials, in the context of nanoparticle and nanorod growth, MC simulations [12,40], multiscale modeling [41,42] and enhanced multiscale modeling with Artificial Neural Network (ANN) [43][44][45][46] have been performed. "Classical" kMC models have also used for the deposition of diamond [47], AlN [48] and GaAs [49] film, plasma enhanced a-Si:H CVD [50], hybrid MD/kMC [51] and for growth in extereme pressure conditions [52].…”
Section: Chemical Vapor Depositionmentioning
confidence: 99%
“…Besides 2D materials, in the context of nanoparticle and nanorod growth, MC simulations [12,40], multiscale modeling [41,42] and enhanced multiscale modeling with Artificial Neural Network (ANN) [43][44][45][46] have been performed. "Classical" kMC models have also used for the deposition of diamond [47], AlN [48] and GaAs [49] film, plasma enhanced a-Si:H CVD [50], hybrid MD/kMC [51] and for growth in extereme pressure conditions [52].…”
Section: Chemical Vapor Depositionmentioning
confidence: 99%
“…In real production systems, the process dynamics is constantly evolving and changing with respect to time, and these uncertainties in the system thus pose a significant hindrance and deter effective control by MPC. To address this issue, some recent works have developed MPC under uncertainty using ML methods. , For example, in ref the authors proposed a robust economic model predictive controller using the deep deterministic policy gradient framework under disturbances and parametric uncertainty. In addition to the design of robust controllers the quantification of model uncertainty and process disturbances resembles an inverse problem of PI learning, where the time-varying process parameters can be estimated based on the latest process data retrieved.…”
Section: Introductionmentioning
confidence: 99%
“…In addition, an operational model was constructed for this process using a hybrid approach of a deep neural network and a first-principles model . ANNs were further used to determine optimum operating conditions for chemical and industrial processes, which contributed to maximizing the feasibility of novel processes from economic and safety perspectives.…”
Section: Introductionmentioning
confidence: 99%