Pulsed UV laser deposition
was exploited for the preparation of
thin Sn50–x
As
x
Se50 (x = 0, 0.05, 0.5, and
2.5) films with the aim of investigating the influence of low arsenic
concentration on the properties of the deposited layers. It was found
that the selected deposition method results in growth of a highly
(h00) oriented orthorhombic SnSe phase. The thin
films were characterized by different techniques such as X-ray diffraction,
scanning electron microscopy with energy-dispersive X-ray spectroscopy,
atomic force microscopy, Raman scattering spectroscopy, and spectroscopic
ellipsometry. From the results, it can be concluded that thin films
containing 0.5 atom % of As exhibited extreme values regarding crystallite
size, unit cell volume, or refractive index that significantly differ
from those of other samples. Laser ablation with quadrupole ion trap
time-of-flight mass spectrometry was used to identify and compare
species present in the plasma originating from the interaction of
a laser pulse with solid-state Sn50–x
As
x
Se50 materials in
both forms, i.e. parent powders as well as deposited thin films. The
mass spectra of both materials were similar; particularly, signals
of Sn
m
Se
n
+ clusters with low m and n values were observed.