As-grown textured zinc oxide films by ion beam treatment and magnetron sputtering

Zhang, Wendi; Bunte, E.; Ruske, F.; Köhl, D.; Besmehn, Astrid; Worbs, Janine; Siekmann, H.; Kirchhoff, J.; Gordijn, A.; Hüpkes, J.

doi:10.1016/j.tsf.2011.04.098

Cited by 14 publications

(2 citation statements)

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“…As the incident light reaches the textured surface, it can be scattered from the rough surface. This results in the light trapping inside the solar cell, which improves the current output and consequently the conversion efficiency of solar cells [1]. Textured interface can be fabricated using either a textured substrate [2] or hot-embossing lithography [3], or a transparent conductive oxide, which has a roughness surface [4].…”

Section: Introduction mentioning

confidence: 99%

Optical and Electrical Performance of ZnO Films Textured by Chemical Etching

Her¹,

Chi²

2015

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Zinc oxide (ZnO) films were prepared by radio frequency (RF) magnetron sputtering on the glass substrate as transparent conductive oxide films. For silicon solar cells, a proper surface texture is essential to introduce light scattering and subsequent light trapping to enhance the current generation. In this study, the magnetron-sputtered ZnO films were textured by wet-chemical etching in diluted hydrochloric acid (HCl) for better light scattering. The diffuse transmittance of the surface textured ZnO films was measured to evaluate the light scattering. The influence of hydrochloric acid concentration on the morphology, optical and electrical properties of the surface-textured ZnO film was investigated. The ZnO film etched in 0.05M HCl solution for 30 s exhibited average diffuse transmittance in the visible wavelength range of 9.52 % and good resistivity of 1.10 x 10 -3 cm while the as-deposited ZnO film had average diffuse transmittance of 0.51 % and relatively high resistivity of 5.84 x 10 -2 cm. Experimental results illustrated that the optical and electrical performance of ZnO films can be significantly improved by introducing the surface texture through the wet-chemical etching process.

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Section: Introduction mentioning

confidence: 99%

Optical and Electrical Performance of ZnO Films Textured by Chemical Etching

Her¹,

Chi²

2015

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“…Nowadays, for AZO films, there are several techniques to obtain the optimized surface texture, including the growth on pretreatment of surface texture substrate [16], as-treatment for parameter mediation [17e19] and post treatment for texture surface [20]. The last one exhibits the advantage of improving the scattering ability without sacrificing the optoelectronic properties [21].…”

Section: Introductionmentioning

confidence: 99%