2017
DOI: 10.1016/j.partic.2016.12.001
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Assembly of charged aerosols on non-conducting substrates via ion-assisted aerosol lithography (IAAL)

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Cited by 5 publications
(4 citation statements)
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“…Furthermore, Choi's group developed EAAL to extend the scope of applicable substrates. You et al 39 introduced methods using condensed conducting liquid film on a nonconductive substrate, which can be easily eliminated by evaporation after printing nanoparticles and Kang et al 44 suggested an ion injection technique that utilizes opposite polarity chargers to the accumulated chargers in the growing structures. Using the former technique, PSL nanoparticles are printed on 0.7 mm thick glass and 0.1 mm thick nonconductive and flexible polyethylene terephthalate (PET) films.…”
Section: Nanoparticle Printing Technique Via Eaalmentioning
confidence: 99%
“…Furthermore, Choi's group developed EAAL to extend the scope of applicable substrates. You et al 39 introduced methods using condensed conducting liquid film on a nonconductive substrate, which can be easily eliminated by evaporation after printing nanoparticles and Kang et al 44 suggested an ion injection technique that utilizes opposite polarity chargers to the accumulated chargers in the growing structures. Using the former technique, PSL nanoparticles are printed on 0.7 mm thick glass and 0.1 mm thick nonconductive and flexible polyethylene terephthalate (PET) films.…”
Section: Nanoparticle Printing Technique Via Eaalmentioning
confidence: 99%
“…Electrically charged gas-phasegenerated NPs offer additional control as an electric field can be used to attract them to the substrate. Recently, new techniques have emerged combining charged aerosol NPs and top-down processing of dielectric materials to enable electric-field assisted aerosol lithography [28] and 3D printing of micro and nanostructures [29,30].…”
Section: Introductionmentioning
confidence: 99%
“…[24] The fundamentals of this method are based on the works of Heiko Jacobs, Thomas Krinke and Hiroshi Fudouzi on particle deposition using Coulomb forces. [25][26][27][28] An electrostatic lens is a thin dielectric mask made of photo or electronic resist, [21,29] silicon nitride, [30] or silicon dioxide [31,32] with focusing holes of 200-400 nm. Fabrication of this lens requires the use of a DOI: 10.1002/pssr.202300492 A new approach of electrostatically focusing nanoparticles through an electrical tape mask to form narrow <10 μm and conductive microstructures is developed and investigated in this work.…”
Section: Introductionmentioning
confidence: 99%
“…[ 24 ] The fundamentals of this method are based on the works of Heiko Jacobs, Thomas Krinke and Hiroshi Fudouzi on particle deposition using Coulomb forces. [ 25–28 ] An electrostatic lens is a thin dielectric mask made of photo or electronic resist, [ 21,29 ] silicon nitride, [ 30 ] or silicon dioxide [ 31,32 ] with focusing holes of 200–400 nm. Fabrication of this lens requires the use of a multi‐step and expensive lithographic process, and thus limits the prevalence of the IAAL method.…”
Section: Introductionmentioning
confidence: 99%