Assembly of Patterned Graphene Film Aided by Wetting/Nonwetting Surface on Liquid Interface

Wang, Zhuo; Yang, Xuesong; Chen, Maggie Yihong

doi:10.1109/tnano.2014.2312951

Cited by 3 publications

(1 citation statement)

References 19 publications

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“…HMDS is one kind of self-assembled-monolayer (SAM), primarily used on substrates before the spin coating of photoresist. It makes the surface hydrophobic by elimination of hydroxyl (−OH) groups on the surface or defective graphene edges . This property has been already utilized to suppress the substrate effect on graphene.…”

Section: Results and Discussionmentioning

confidence: 99%

Hydrophobic Surface Treatment and Interrupted Atomic Layer Deposition for Highly Resistive Al₂O₃ Films on Graphene

Jeon

Jerng

Akbar

et al. 2016

ACS Appl. Mater. Interfaces

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The deposition of thin and uniform dielectric film on graphene is an important step for electronic applications. Here, we tackled this problem by combining a simple chemical treatment of graphene surface and a modification of standard atomic layer deposition (ALD). Instead of common approaches trying to convert hydrophobic graphene surface into hydrophilic one, we took the opposite way by applying a self-assembled-monolayer, hexamethyldisilazane (HMDS) to make defect-independent, more hydrophobic surface condition. In addition, AlO ALD using trimethylaluminum (TMA) and water (HO) was interrupted several times and the surface was air-exposed during the interruption to seed the following ALD processes. This combination greatly improved the uniformity of dielectric film and accomplished a successful deposition of 10 nm-thick AlO on graphene with subnanometer roughness except for the locations of wrinkles and poly(methyl methacrylate) (PMMA) residues. Electrochemical impedance measurements revealed a 300-fold increase in the charge-transfer resistance by employing this modified ALD process. No change in the Raman spectra was observed after the dielectric film growth, demonstrating that the method proposed here is nondetrimental to the graphene quality.

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Section: Results and Discussionmentioning

confidence: 99%

Hydrophobic Surface Treatment and Interrupted Atomic Layer Deposition for Highly Resistive Al₂O₃ Films on Graphene

Jeon

Jerng

Akbar

et al. 2016

ACS Appl. Mater. Interfaces

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Dip- and die-coating of hydrophilic squares on flat, hydrophobic substrates

Brasjen

Wedershoven

Cuijk

et al. 2017

Chemical Engineering Science

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Patterned films from exfoliated two-dimensional transition metal dichalcogenides assembled at a liquid–liquid interface

et al. 2017

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Assembly of Patterned Graphene Film Aided by Wetting/Nonwetting Surface on Liquid Interface

Cited by 3 publications

References 19 publications

Hydrophobic Surface Treatment and Interrupted Atomic Layer Deposition for Highly Resistive Al₂O₃ Films on Graphene

Hydrophobic Surface Treatment and Interrupted Atomic Layer Deposition for Highly Resistive Al₂O₃ Films on Graphene

Dip- and die-coating of hydrophilic squares on flat, hydrophobic substrates

Patterned films from exfoliated two-dimensional transition metal dichalcogenides assembled at a liquid–liquid interface

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Assembly of Patterned Graphene Film Aided by Wetting/Nonwetting Surface on Liquid Interface

Cited by 3 publications

References 19 publications

Hydrophobic Surface Treatment and Interrupted Atomic Layer Deposition for Highly Resistive Al2O3 Films on Graphene

Hydrophobic Surface Treatment and Interrupted Atomic Layer Deposition for Highly Resistive Al2O3 Films on Graphene

Dip- and die-coating of hydrophilic squares on flat, hydrophobic substrates

Patterned films from exfoliated two-dimensional transition metal dichalcogenides assembled at a liquid–liquid interface

Contact Info

Product

Resources

About

Hydrophobic Surface Treatment and Interrupted Atomic Layer Deposition for Highly Resistive Al₂O₃ Films on Graphene

Hydrophobic Surface Treatment and Interrupted Atomic Layer Deposition for Highly Resistive Al₂O₃ Films on Graphene