We report here the synthesis of 5-phenylthio-2'-deoxyuridine (d PhS U), its incorporation into oligodeoxynucleotides (ODNs), and its photocyclization chemistry. Irradiation of dinucleoside monophosphate d( PhS UG) and d PhS U-bearing duplex ODNs with 254 nm light results in the facile formation of a cyclic product where the C6 of uracil is covalently bonded to the C2 of the phenyl Yinsheng.Wang@ucr.edu. Supporting Information Available. NMR spectra of synthetic compounds, LC traces, MS data, and LC-MS/MS results. This material is available free of charge via Internet at http://pubs.acs.org. ring. The chemistry reported here may serve as the basis for the efficient preparation of a new class of duplex DNA with an extended π system.
NIH Public AccessPhenylthio-substituted nucleosides have been successfully employed as photolabile precursors for the generation of carbon-centered radicals to mimic the deleterious effects of ionizing radiation 1-6 . In addition, it has been shown that the photoirradiation of pyrimidine nucleosides with a halogen atom being substituted at the C5 position may result in the formation of C5-centered radicals 7-10 . It remains unclear what the photochemistry is for pyrimidine nucleosides bearing a 5-thiophenyl moiety.In this study, we set out to explore this chemistry by first synthesizing 5-phenylthio-2'-deoxyuridine (d PhS U). The incorporation of a phenylthio group to the C5 of uracil was inspired from the previous procedures for the preparation of 8-benzyloxy-2'-deoxyguanosine 11 . In this regard, treatment of the commercially available 5-bromo-2'-deoxyuridine with thiophenol and sodium in DMSO renders the desired 5-phenylthio-2'-deoxyuridine in ∼47% yield (Scheme 1). We then synthesized the phosphoramidite building block of d PhS U following standard procedures 12 and inserted it into dinucleoside monophosphate and ODNs by automated solidphase synthesis (Scheme 1).We next examined the photochemistry of d( PhS UG) and d PhS U-bearing ODNs. Here we began our discussion with the major product isolated from the irradiation mixture of d( PhS UG) (The HPLC trace for the separation of the 254 nm irradiation mixture is shown in Figure 1a). Negative-ion ESI-MS of the major fraction eluting at 51.3-min gave an ion of m/z 661.8 ( Figure 1a, inset), and we designate the product as d ( To further elucidate the structure of the major product, we recorded its 1 H-NMR spectrum, which showed the presence of four aromatic protons ( Figure S5). These protons can be assigned to the protons of the phenyl group, which is supported by 2-D NOESY measurement ( Figure S6). The losses of the H6 proton of uracil and an aromatic proton from the phenyl ring support the proposed structure of the major photoproduct (Scheme 2). It is worth noting that the NMR spectra are also consistent with an alternative cyclic structure where the sulfur is bonded to the C6 of the uracil component. This possibility, however, can be excluded for two reasons. First, the formation of the latter product would necessitate th...